Phase-shift grating manufacturing method and phase-shift grating

Abstract

The invention provides a method for manufacturing a phase-shift grating, the method comprising: forming a first-layer template on a substrate; performing photolithography on the first-layer template according to a preset mask, and splitting the first-layer template into a plurality of separate The first boss, the bottom of the first gap between the first bosses is the exposed substrate; the second layer template is formed on the outer surface of the first boss and the exposed surface of the substrate; the second layer template is etched, Splitting the second-layer template into a plurality of separate second bosses; the first boss is located between adjacent second bosses; the first boss is removed; the gap between the second bosses is coated with photolithography glue to form a first photoresist soft template; perform holographic exposure and development on the first photoresist soft template to form a second gap on the first photoresist soft template to expose the substrate at the bottom of the second gap; The exposed part of the substrate is etched and the second protrusion is etched away to form a grating. The manufacturing method of the phase shift grating provided by the embodiment of the present invention has high efficiency.

Description

technical field [0001] The invention relates to the technical field of gratings, in particular to a method for manufacturing a phase-shifting grating and the phase-shifting grating. Background technique [0002] A distributed feedback (Distributed Feed Back, DFB for short) laser is a chip that is widely used in optical communications. Since the phase shift grating introduces a region with a constant refractive index inside the grating of the DFB laser, which improves the single-mode yield of the DFB laser, it is more and more widely used in the DFB laser. [0003] At present, the production method of phase shift grating is to use electron beam lithography (EBL). EBL records the required grating pattern in the equipment system, and then uses a high-energy electron beam with a very short wavelength to print on the substrate according to the grating pattern in the equipment system. EBL is a typical serial photolithography process, and its biggest disadvantage is slow productio...

AI Technical Summary

Problems solved by technology

[0004] The invention provides a method for manufacturing a phase shift grating and the phase shift grating, which solves the problems of high production cost and low production efficiency of the phase shift grating in the prior art

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