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Method for spark deposition using ceramic targets

A vapor deposition, arc technology, applied in the source of coating equipment, the field of coating equipment, can solve the problem of overheating, plate breakage and so on

Inactive Publication Date: 2017-02-22
OERLIKON SURFACE SOLUTIONS AG PFAFFIKON
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0008] For the TiB2 target, the problem is reported accordingly in the article "ceramic cathodes for arc-physical vapordeposition: development and application" by O. Knotek, F. Loeffler, surface and coating technology 49 (1991) pp. 263 to 267, which finds Cathode spots are concentrated in localized locations, which leads to overheating of the plates and even to breakage of the plates

Method used

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  • Method for spark deposition using ceramic targets
  • Method for spark deposition using ceramic targets
  • Method for spark deposition using ceramic targets

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Embodiment Construction

[0019] exist figure 1 An arc vapor deposition source according to the invention is shown in , as it is used in an arc vapor deposition chamber for coating a substrate. The arc vapor deposition source generally comprises an ignition device 20 (as shown purely schematically) for igniting the arc. In addition, a large current -I H , low voltage U L - DC voltage source 23 .

[0020] The arc source according to the invention comprises an electrically conductive ceramic target plate 1 with a surface 2 to be vapor deposited. On the rear surface 7 of the target plate 1 , ie on the surface facing away from the surface 2 to be vapor deposited, a cooling plate 10 is arranged in effective thermal connection with the target plate 1 over a large area. The cooling plate 10 is made of a material with high thermal conductivity. Through the large-area thermal contact, the cooling plate is able to quickly and efficiently distribute the local energy input via the cathode spots onto the targe...

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PUM

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Abstract

The present invention relates to an arc deposition source, comprising an electrically conductive ceramic target plate (1), on the back of which a cooling plate (10) is provided, wherein a shield (3) is provided in the central area on the surface to be coated so that the cathode spot of the arc does not reach the central area (6) of the surface during operation of the deposition source.

Description

[0001] The present invention is a divisional application of the application with the same name whose application number is 201180022287.2 and whose application date is April 13, 2011. technical field [0002] The invention relates to a method for coating workpieces by means of cathodic arc vapor deposition and electrically conductive ceramic targets. In particular, the invention relates to a source for a coating device for carrying out the above-mentioned method. In particular, the invention relates to a coating device for carrying out the above-mentioned method. Background technique [0003] It is disclosed that workpieces are coated by generating a plasma in the form of a high current-low voltage arc discharge in a vacuum chamber on a material source (hereinafter referred to as target). The material to be vapor-deposited is arranged as cathode in this process at the negative pole of the voltage source. The arc is ignited with the aid of an ignition device. The arc melts...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/32
CPCC23C14/325H01J37/34H01J37/3426C23C14/32H01J37/32
Inventor M.莱希塔勒
Owner OERLIKON SURFACE SOLUTIONS AG PFAFFIKON