A gas reaction chamber for preparing ybco strips by mocvd

Abstract

The invention belongs to the technical field of thin film preparation, in particular to a gas reaction chamber for preparing YBCO strips by MOCVD. It includes a reaction copper pipe, an intake and exhaust chamber connected to both ends of the reaction copper pipe, and a cooling pipe. The two ends of the reaction copper pipe are connected to the intake and exhaust chamber; the conductive heat is wound around the reaction copper pipe and the cooling pipe; there is a hole in the intake and exhaust chamber, which is in a straight line with the reaction copper pipe in the middle of the reaction chamber. The bottom passes through the pores. When in use, the entire reaction process is only concentrated in the reaction copper tube. The gas enters the reaction chamber and is pumped away, and the diffusion space is small, so the utilization rate of metal-organic sources is greatly improved and the cost is reduced; at the same time, it can be realized on the substrate. The two sides of the film are grown simultaneously, and the out-of-plane uniformity and consistency of the prepared film are guaranteed.

Description

technical field [0001] The invention belongs to the technical field of thin film preparation, and relates to a gas reaction chamber used for metal-organic chemical vapor deposition (MOCVD), which can be used for the preparation of YBCO superconducting strips, specifically a gas reaction chamber for preparing YBCO strips by MOCVD cavity. Background technique [0002] Metal-organic compound chemical vapor deposition, its English name is Metal-organic Chemical VaporDe7position, abbreviated as MOCVD, is a new type of vapor phase epitaxy growth technology developed on the basis of vapor phase epitaxy (VPE). Organic compounds of elements and hydrides of group V and VI elements are used as source materials for vapor deposition, and various III-V or II-VI compounds are grown on high-temperature substrates through diffusion, gas-phase reactions, and surface chemical reactions. Thin-layer single-crystal materials of semiconductors and their multicomponent solid solutions. Compared w...

AI Technical Summary

Problems solved by technology

However, the gas ejected from the double shower head structure will lead to uneven distribution of the temperature field directly under the shower head, resulting in uneven thickness of the deposited film, and this deposition method has low utilization rate of metal-organic sources and high cost

Images