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Mosaic area splicing method and system

A mosaic and area technology, applied in optics, instruments, nonlinear optics, etc., can solve the problems of long time, complex algorithm, relatively large impact on production capacity, etc., to save time and improve efficiency.

Inactive Publication Date: 2017-02-22
SHENZHEN CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The traditional mosaic pattern is randomly generated by an algorithm. In actual production, the two mosaic areas are in a complementary form, and a complete figure is finally formed through two exposures. Using such a mosaic pattern design, it takes at least four times to make a panel Exposure, which has a relatively large impact on production capacity
In addition, when designing such a mosaic pattern, the algorithm is complicated, and the calculation of the mosaic area needs to be performed twice for two areas, which often takes a long time and is inefficient

Method used

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  • Mosaic area splicing method and system
  • Mosaic area splicing method and system
  • Mosaic area splicing method and system

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Embodiment Construction

[0034] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0035] In addition, the following descriptions of the various embodiments refer to the attached drawings to illustrate specific embodiments in which the present invention can be implemented. The directional terms mentioned in the present invention, for example, "upper", "lower", "front", "rear", "left", "right", "inner", "outer", "side", etc., only is to refer to the direction of the attached drawings. Therefore, the direction terms used are for ...

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Abstract

Provided is a display panel manufacturing method. A substrate is provided; the substrate is divided into a first zone and a second zone which are same in area; a photomask is provided and covers the first zone, and one side of the photomask is provided with a mosaic pattern, wherein the mosaic pattern is complementary with an original mosaic pattern after being turned at 180 degrees; photo masking is conducted on the first zone, wherein the mosaic pattern is formed on the side, close to the second zone, of the first zone; the photomask is turned at 180 degrees to conduct photo masking on the second zone, wherein the mosaic pattern is formed on the side, close to the first zone, of the second zone and combines with mosaics, close to the second zone, of the first zone, and accordingly a display panel is formed. Therefore, by utilizing the photomask splicing method, manufacturing of the display panel can be completed only by needing twice photo masking, the time is saved, and the efficiency is improved. The invention further provides a liquid crystal display.

Description

technical field [0001] The present invention relates to the field of display technology, in particular to a method and system for splicing mosaic regions. Background technique [0002] In the current panel design, the proportion of large-size products is gradually increasing. When the size of the manufactured panel exceeds the size of a photomask, photomask splicing is required. The biggest problem in splicing mask design is that the splicing between different masks is uneven, because there will be some differences in the film thickness of the junction area of ​​the two masks, and this difference is a sudden change. A clear dividing line can be seen when the panel is lit. After using the mosaic splicing design, this sudden difference can be converted into a gradient in the transition area, so that there is no obvious splicing unevenness. The traditional mosaic pattern is randomly generated by an algorithm. In actual production, the two mosaic areas are in a complementary f...

Claims

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Application Information

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IPC IPC(8): G02F1/13G03F7/20
Inventor 杜鹏
Owner SHENZHEN CHINA STAR OPTOELECTRONICS TECH CO LTD