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An inverted pushing electric cylinder device

An inverted, electric cylinder technology, applied in the direction of metal material coating process, coating, gaseous chemical plating, etc., can solve the problems that the upper cover plate and the chamber cannot be completely closed, the limit switch cannot be fully triggered, etc.

Active Publication Date: 2018-10-23
PIOTECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The technical problem to be solved by the present invention is to provide an inverted push electric cylinder device, which mainly solves the problem that the upper cover plate and the chamber cannot be completely closed due to the sensitivity of the limit switch in the existing cavity opening method, or the limit switch can not be closed after closing. Issues such as inability to fully trigger

Method used

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  • An inverted pushing electric cylinder device
  • An inverted pushing electric cylinder device
  • An inverted pushing electric cylinder device

Examples

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Embodiment Construction

[0014] In order to make the object, technical solution and advantages of the present invention more clear, the present invention will be further described in detail below in conjunction with the examples. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0015] see figure 1 , an inverted pusher electric cylinder device, an auxiliary device for open cavity structure used in semiconductor thin film deposition equipment, suitable for the open cavity method of an inverted push electric cylinder, see figure 2 , installed upside down on the upper cover plate 4 of the deposition equipment, including the electric cylinder 5 and the electric cylinder rod 6, the electric cylinder 5 is installed on the upper end of the electric cylinder rod 6, the electric cylinder rod 6 is perpendicular to the upper cover plate 4, and the electric cylinder rod 6 It is set as a hollow structure, and...

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Abstract

The invention relates to an inverted electric cylinder pushing device, is applied to a cavity opening structure auxiliary device of semiconductor film deposition equipment, improves the stability of trigger signals at the time of closing a cavity cover through adding a certain empty travels, and belongs to the technical field of semiconductor film deposition application and manufacturing. The inverted electric cylinder pushing device comprises an electric cylinder mounted on an electric cylinder rod; the electric cylinder rod is a hollow structure, and is provided with a push rod inside; the electric cylinder rod is fixed on an upper cover plate; the push rod penetrates through the upper cover plate, and can extend in the electric cylinder rod to realize contact with the cavity or empty travel with the cavity; and a limiting pressure block is mounted at the end part of the push rod, and is matched with a limiting switch mounted on the cavity for limiting the distance of the empty travel. The inverted electric cylinder pushing device adds the empty travel, so that the upper cover plate can be totally closed with the cavity to prevent incapability of reaching the vacuum degree requirement due to incomplete closing.

Description

technical field [0001] The invention relates to a cavity opening structure auxiliary device applied to semiconductor thin film deposition equipment, which is suitable for the cavity opening mode of an inverted push electric cylinder, and improves the stability of a trigger signal when the cavity cover is closed by adding a certain idle stroke. The invention belongs to the technical field of semiconductor thin film deposition application and manufacture. Background technique [0002] When the semiconductor thin film deposition equipment is performing the deposition reaction, it needs to be carried out under vacuum conditions, which requires the chamber to be completely sealed when the equipment is started. If the chamber cannot be completely closed, it may cause the chamber to fail to meet the process pressure requirements, or process gas leakage may cause dangerous consequences. The vertical lifting and opening method may cause problems such as the upper cover and the chamb...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/44
Inventor 陈英男梁立元姜崴郑旭东关帅李景舒霍阳阳
Owner PIOTECH CO LTD
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