A chemical vapor deposition device
A technology of chemical vapor deposition and diffuser, which is applied in the direction of gaseous chemical plating, metal material coating process, coating, etc., can solve the problem of low production efficiency of chemical vapor deposition equipment, and achieve the effect of improving production efficiency
Active Publication Date: 2019-09-24
WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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[0007] The object of the present invention is to provide a kind of chemical vapor deposition device, to solve the technical problem that the production efficiency of existing chemical vapor deposition device is low
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[0027] The following descriptions of the various embodiments refer to the accompanying drawings to illustrate specific embodiments in which the present invention can be practiced. The directional terms mentioned in the present invention, such as "up", "down", "front", "back", "left", "right", "inside", "outside", "side", etc., are for reference only The orientation of the attached schema. Therefore, the directional terms used are used to illustrate and understand the present invention, but not to limit the present invention. In the figures, structurally similar units are denoted by the same reference numerals.
[0028] Please refer to figure 1 , figure 1 It is a schematic structural diagram of a chemical vapor deposition device in a preferred embodiment of the present invention.
[0029] Such as figure 1 As shown, the chemical vapor deposition apparatus 100 of the present invention includes a stage 11 and a diffuser 12 . The stage 11 is arranged opposite to the diffuser ...
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The invention provides a chemical vapor deposition device. The chemical vapor deposition device comprises a diffuser and a carrying table, wherein the diffuser is used for diffusing gas to be deposited to form a thin film; the carrying table is used for storing a substrate to be deposited, and the carrying table and the diffuser are arranged relatively; at least one group of light distance detection assembly is arranged between the diffuser and the carrying table; the light distance detection assembly is used for measuring a distance between the diffuser and the carrying table. According to the chemical vapor deposition device provided by the invention, the light distance detection assembly is arranged between the diffuser and the carrying table; the light distance detection assembly is used for detecting the distance between the diffuser and the carrying table; in a detection process, cooling treatment does not need to be carried out so that the production efficiency is improved.
Description
【Technical field】 [0001] The invention relates to the technical field of liquid crystal displays, in particular to a chemical vapor deposition device. 【Background technique】 [0002] Plasma-enhanced chemical vapor deposition (PE CVD) uses microwave or radio frequency to ionize the gas containing the constituent atoms of the film to form plasma locally, and the plasma is chemically active and easy to react, thus depositing on the substrate film out. [0003] In order to enable the chemical reaction to proceed at a lower temperature, the activity of the plasma is used to promote the reaction. The reaction gas is introduced into the reactor, and dissociated under the action of heat energy, electric energy or light energy to become highly active ions or ion clusters; the ions or ion clusters reach the surface of the solid substrate by diffusion to undergo a chemical reaction to form solid products and Deposited on the surface of the substrate; during the film formation process...
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IPC IPC(8): C23C16/44
Inventor 张恺
Owner WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD