Optical film ultra wide band optical constant testing method

An optical film and optical constant technology, applied in the measurement of color/spectral characteristics, etc., to avoid large operational errors

Active Publication Date: 2017-05-24
TIANJIN JINHANG INST OF TECH PHYSICS
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0008] The technical problem to be solved by the present invention is: how to realize the uniform test of the optical constants of the film in the ultraviolet to infrared band on a single film sample

Method used

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  • Optical film ultra wide band optical constant testing method
  • Optical film ultra wide band optical constant testing method

Examples

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Effect test

example 1

[0061] Example 1: HfO 2 Measurement of Ultra-broadband Optical Constants of Thin Films

[0062] 1. Preparation of HfO on silicon substrate by ion beam sputtering deposition 2 film;

[0063] 2. Using ellipsometry to measure silicon substrate HfO 2 Reflection ellipsometry psi and delta from visible light to near-infrared film, the test angles are 55° and 65° respectively, the test wavelength range is 0.238μm-1.666μm, the test step interval is 10nm, and the corresponding wave number range is 42000cm -1 -6000cm -1 , the reflection ellipsometry psi test results see figure 1 , the reflection ellipsometry delta test results are shown in figure 2 ;

[0064] 3. Using infrared Fourier transform spectrometer to measure silicon substrate HfO 2 The infrared transmittance spectrum of the film, the wavelength range is from 1.25μm-25μm, and the corresponding wavenumber range is 8000cm -1 -400cm -1 , the test wave number interval is 0.2cm -1 , the test angle is 0°, the test results ...

example 2

[0067] Example 2: Ta 2 o 5 Measurement of Ultra-broadband Optical Constants of Thin Films

[0068] 1. Preparation of Ta on silicon substrate by ion beam sputtering deposition 2 o 5 film;

[0069] 2. Using ellipsometry to measure silicon substrate Ta 2 o 5 Reflection ellipsometry psi and delta from visible light to near-infrared film, the test angles are 55° and 65° respectively, the test wavelength range is 0.238μm-1.666μm, the test step interval is 10nm, and the corresponding wave number range is 42000cm -1 -6000cm -1 , the reflection ellipsometry psi test results see Figure 5 , the reflection ellipsometry delta test results are shown in Figure 6 ;

[0070] 3. Using infrared Fourier transform spectrometer to measure silicon substrate Ta 2 o 5 The infrared transmittance spectrum of the film, the wavelength range is from 1.25μm-25μm, and the corresponding wavenumber range is 8000cm -1 -400cm -1 , the test wave number interval is 0.2cm -1 , the test angle is 0°, ...

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Abstract

The invention discloses an optical film ultra wide band optical constant testing method for calculating an optical constant of a whole spectrum range from a visible light band to an infrared band of an optical film material. Particularly, a spectral transmission factor of a substrate-film transparent zone and the spectral transmission factor of a non-transparent zone are compounded as a target spectrum in the wavelength range of 0.3 microns-20 microns, a vibrator model is adopted as a chromatic dispersion model of the optical constant, and the ultra wide band optical constant of the film is calculated through target spectrum data back calculation. The optical film ultra wide band optical constant testing method has universality for film materials.

Description

technical field [0001] The invention belongs to the technical field of optical thin films, in particular to the detection technology related to the characteristics of optical thin films, and relates to a method for testing ultra-broadband optical constants of optical thin films. Background technique [0002] In the field of optical thin film technology, optical constants are one of the important parameters for multilayer film design and optical performance characterization, and the characterization and measurement of optical constants is one of the primary tasks. In recent years, with the development of ultra-broadband optical thin film applications, such as broadband solid-state tuned laser technology (400nm-1200nm), broadband infrared spectral imaging technology (0.9um-14um), three-light composite detection technology (0.7um-12um), etc. The development of optical thin films puts forward the demand of broadband and even ultra-wideband. Therefore, the characterization and t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/25
CPCG01N21/25
Inventor 刘华松刘丹丹王利栓姜玉刚季一勤
Owner TIANJIN JINHANG INST OF TECH PHYSICS
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