Light illumination response safety element
A security element and lighting technology, which is applied in the field of optical security, can solve problems such as image blur, increase the thickness of security elements, and restrict security performance, and achieve high anti-copy performance, ultra-thin, and high security performance.
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Embodiment 1
[0069] See Figure 1 to Figure 2 As shown, figure 1 It is a schematic cross-sectional view of the structure of the security element under point light source illumination in this embodiment. The light-responsive security element in this embodiment is composed of a focusing element array layer 1, a substrate layer 2 and a micropattern array layer 3. The film-type security element 10 is formed by bonding the layers to each other. The focusing element array layer 1 is formed by orthogonally arranging focusing units, the focusing units are spherical lens units 4, and the array period is T microns. The micro-pattern array layer 3 is formed by orthogonally arranging the micro-pattern units 5, and the array period is 1.003T microns. The symmetry axis of the focusing element array and the symmetry axis of the micro graphic unit array are parallel to each other. The micro pattern array layer 3 and the focusing unit array layer 1 are located on both sides of the substrate layer 2. In thi...
Embodiment 2
[0072] See Figure 3 to Figure 4 As shown, image 3 It is a schematic cross-sectional view of the structure of the security element under point light source illumination in this embodiment. The light-responsive security element in this embodiment is composed of a focusing element array layer 1, a micro-pattern array layer 3, and a substrate layer 2. The film-type security element 10 is formed by bonding the layers to form a film-type security element 10. The focusing element array layer 1 is formed by orthogonally arranged spherical lens units 4, and the array period is T micrometers. The micro-pattern array layer 3 is formed by orthogonally arranged micro-pattern units 5, and the array period is 0.995T microns. The symmetry axis of the focusing element array and the symmetry axis of the micro graphic unit array are parallel to each other. The micro-pattern array layer 3 and the focusing unit array layer 1 are located on the same side of the substrate layer 2, and the micro-pa...
Embodiment 3
[0075] See Figure 5 to Figure 6 As shown, Figure 5 It is a schematic cross-sectional view of the structure of the security element under point light source illumination in this embodiment. The security element in this embodiment is composed of a focusing element array layer 1, a substrate layer 2, and a micropattern array layer 3. The layers are bonded to each other to form a film-type security element 10. The focusing element array layer 1 is formed by orthogonally arranged spherical lens units 4, and the array period is T micrometers. The micro-pattern array layer 3 is formed by orthogonally arranged micro-pattern units 5, and the array period is 1.005T microns. The symmetry axis of the focusing element array and the symmetry axis of the micro graphic unit array are parallel to each other. The micro pattern array layer 3 and the focusing unit array layer 1 are located on both sides of the substrate layer 2, and the micro pattern array layer 3 is located at 1.4 times the fo...
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