Two-dimensional scanning device for controlling circular injection of ions

A two-dimensional scanning and circular technology, which is applied in semiconductor/solid-state device manufacturing, discharge tubes, electrical components, etc., can solve the problems that circular scanning and arbitrary area scanning cannot be realized, so as to reduce scanning time and strengthen local scanning Effect

Inactive Publication Date: 2017-06-09
CHANGSHA UNIVERSITY
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Problems solved by technology

These scanning methods are all rectangular scanning, and c

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  • Two-dimensional scanning device for controlling circular injection of ions
  • Two-dimensional scanning device for controlling circular injection of ions

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[0015] See figure 1 , The whole system is composed of main control computer, communication interface circuit, DSP processor, FPGA, keyboard, two-way high-speed DAC conversion circuit, two-way filter circuit, two-way buffer amplifier circuit and high-voltage amplifier circuit. DSP processor and FPGA are the core modules of the entire system. DSP adopts the ADSP-BF531 embedded processor from Analog Devices, and uses its own rich interface features to build peripherals such as LAN, USB, UART, etc., to complete the communication with the host computer. Design of external interface circuits such as data communication, keyboard and network port. FPGA adopts Cyclone III EP3C16Q240C8N, and uses internal RAM to store waveform data to complete the waveform generation function.

[0016] The DSP processor has super digital signal processing and comprehensive control capabilities, completes the control of the entire system, operates the FPGA by receiving the control commands from the keyboard...

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Abstract

The invention discloses a two-dimensional scanning device for controlling circular injection of ions, which belongs to the field of semiconductor manufacturing. The device comprises a master control machine, a communication interface circuit, a DSP, an FPGA, a keyboard, two high-speed DAC conversion circuits, two filter circuits, two buffer amplifier circuits, and two high-voltage amplifier circuits. The two high-voltage amplifier circuits are connected with the two buffer amplifier circuits. The two buffer amplifier circuits are connected with the two high-speed DAC conversion circuits. The FPGA is connected with the two high-speed DAC conversion circuits. The DSP is connected with the FPGA. The master control machine is connected with the DSP through the communication interface circuit to carry out data communication, start-stop control and work status indication. According to the invention, an ion-injected wafer can be scanned circularly, any area of an ion-injected wafer can be scanned, and the scanning time is reduced.

Description

technical field [0001] The invention relates to a two-dimensional scanning device for controlling ion circular implantation, relates to an ion implanter, and belongs to the field of semiconductor equipment manufacturing. Background technique [0002] Ion implantation technology is a high-tech material surface modification that has been vigorously developed and widely used internationally in the past 30 years. The application has achieved huge economic and social benefits. In the electronics industry, ion implantation has become an important doping technology in the microelectronics process, and it can be said to be an indispensable means in the contemporary manufacture of large-scale integrated circuits. [0003] Ion implantation currently uses a two-dimensional scanning control device to control the scanning output. The scanning methods include electrical scanning: the wafer is fixed, and electron beam scanning is used in both horizontal and vertical directions; mechanical...

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Application Information

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IPC IPC(8): H01L21/265H01J37/317
CPCH01L21/265H01J37/317H01J37/3171
Inventor 刘辉童雪林刘光灿谢明华熊跃军
Owner CHANGSHA UNIVERSITY
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