A ZNSB-based film with high-efficiency thermoelectric conversion characteristics and its preparation method
A thermoelectric conversion and thin film technology, applied in vacuum evaporation coating, coating, sputtering coating and other directions, can solve the problem of low thermoelectric characteristics of ZnSb-based thin films, and achieve the effect of improving thermoelectric characteristics and optimizing film structure
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Embodiment 1
[0038] Magnetron co-sputtering technology is used to prepare ZnSb-based thin films. Firstly, Sb and Zn targets with a purity of 99.99% are fixed on the two-station target holders of the sputtering system; BK7 optical glass is used as the substrate, and BK7 The optical glass is placed in a container and ultrasonically cleaned with acetone, alcohol and deionized water in sequence; the background vacuum of the sputtering system is pumped to 6.0×10 - 4 Pa, the flow rate is 6sccm high purity Ar gas, the working pressure is controlled at 6.0×10 -2 Pa; Increase the power of the magnetron sputtering system to deposit Sb and Zn on the BK7 optical glass, and the co-sputtering deposition time is 30 minutes.
[0039] After the deposition is completed, the ZnSb-based thin film sample is fixed on the bombardment station frame of the plasma beam bombardment system; the vacuum degree of the plasma beam bombardment system is pumped to 6.0×10 -4 Pa, high-purity argon with a flow rate of 10 sccm, w...
Embodiment 2
[0042] The difference from Example 1 is that the plasma beam is replaced with nitrogen.
Embodiment 3
[0044] The difference from Embodiment 1 is that the plasma beam energy is changed to 0.1 KeV.
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