Array substrate and manufacturing method of array substrate

Abstract

The invention discloses an array substrate and a manufacturing method of the same. The array substrate comprises a gate, a first electrode, a gate insulation layer, a passivation layer and a second electrode, wherein the gate, the first electrode, the gate insulation layer, the passivation layer and the second electrode are arranged on a substrate; the gate includes a first transparent electrode and a first metal electrode; the first electrode includes a third transparent electrode; the first metal electrode is arranged at one side, being far away from the substrate, of the first transparent electrode; the first transparent electrode and the third transparent electrode are arranged at the same layer; the gate insulation layer covers the gate and is not overlapped with the first electrode; the gate is mutually insulated from the first electrode; the passivation layer is arranged between the first electrode and the second electrode; and a drain electrode is electrically connected with the first electrode or the second electrode. By setting the gate insulation layer to be un-overlapped with the first electrode, the scheme of the array substrate can reduce the number of insulation layers between the first electrode and the second electrode and increase the transverse electric field intensity between the two electrodes.

Description

technical field [0001] The present application generally relates to the field of display technology, and in particular to an array substrate and a method for manufacturing the array substrate. Background technique [0002] Liquid crystal display is currently the most widely used flat panel display, which can provide high-resolution color screens for various electronic devices such as mobile phones, personal digital assistants (PDAs), digital cameras, and computers. Among them, a liquid crystal display in a Fringe Field Switching (FFS) mode is favored by users because of its wide viewing angle and high aperture ratio. [0003] An array substrate in FFS mode generally includes a gate, a gate insulating layer, a semiconductor layer, source and drain electrodes, pixel electrodes, a common electrode and a passivation layer. In order to reduce the production cost, the fabrication method of the FFS array substrate has been developed from the original 7-mask technology to the curre...

AI Technical Summary

Problems solved by technology

[0004] Although the array substrate produced by 4mask can reduce the production cost, there is insufficient brightness when the array substrate produced by 4mask is applied to the display device

If the brightness of the display device is increased by increasing the voltage difference between the pixel electrode and the common electrode, large power consumption will be generated

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