Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A ceramic shielding structure between ion source discharge chamber and accelerator

A technology of shielding structure and discharge chamber, which is applied in the direction of magnetic/electric field shielding, discharge tube, shielding material, etc., can solve the problems of difficult ceramic plate processing, large deformation, high processing cost, etc., and meet the requirements of experimental vacuum and deflate The effect of low efficiency and easy processing and assembly

Active Publication Date: 2018-11-30
SOUTHWESTERN INST OF PHYSICS
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

If ceramic materials are used as insulation shielding, it is very difficult to process such a large-sized ceramic plate. Due to the relatively large deformation of the large-sized ceramic plate during the sintering process, the yield rate that meets the deformation requirements is very low, and the corresponding processing cost is high.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A ceramic shielding structure between ion source discharge chamber and accelerator

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0026] The technical solutions of the present invention will be further described in detail below with reference to the drawings and specific embodiments.

[0027] The present invention is a ceramic shielding structure between the ion source discharge chamber and the accelerator, which is applied between the high-power long-pulse ion source discharge chamber and the accelerator of the tokamak device; according to the first 5MW neutral of the HL-2M device The spatial geometric dimensions of the beam ion source discharge chamber and the accelerator include the design of the following aspects:

[0028] According to the spatial geometry of the discharge chamber of the neutral beam ion source and the accelerator, determine the distribution area for arranging the ceramic insulating shielding structure: the outer frame is a rectangular area with a length of 650mm, a width of 360mm, and chamfers of four corners of R20mm;

[0029] A ceramic shielding structure is formed by crimping mul...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
lengthaaaaaaaaaa
widthaaaaaaaaaa
Login to View More

Abstract

The invention belongs to the technical field of insulation and shielding between a high-power long-pulse ion source discharge chamber and an accelerator, and particularly relates to a ceramic shielding structure between an ion source discharge chamber and an accelerator. The ceramic shielding structure is applied between the high-power long-pulse ion source discharge chamber and the accelerator in a Tokamak device. the ceramic shielding structure is designed in the following aspects: according to space geometric sizes of the neutral beam ion source discharge chamber and the accelerator, a distribution area with the ceramic insulation and shielding structure arranged is determined; multiple ceramic sheets are adopted for crimping, a ceramic screw and a ceramic nut are used for fixing each ceramic sheet on the discharge chamber, and a ceramic shielding structure is formed; the complete ceramic shielding structure altogether comprises ceramic sheets with three sizes, and the number of ceramic sheets with each size is four; and the thickness of each ceramic sheet is 3 mm. By adopting the above scheme of the invention, while insulation and shielding between the ion source discharge chamber and the accelerator can be realized, the processing difficulty is reduced, and the processing cost is reduced.

Description

technical field [0001] The invention belongs to the technical field of insulation shielding between a high-power long-pulse ion source discharge chamber and an accelerator, and in particular relates to a ceramic shielding structure between an ion source discharge chamber and an accelerator. Background technique [0002] During the experimental operation of the first neutral beam beamline ion source of the China Circulator HL-2M device, it was found that an insulating shield needs to be added between the ion source discharge chamber and the accelerator to avoid plasma generation between the discharge chamber and the accelerator A partial arc is generated, which eventually leads to abnormal arc discharge, and may damage the discharge chamber and accelerator electrodes in severe cases. Because the ion source is a high-power long-pulse discharge, general insulating materials, such as Mylar or tetrafluoromaterial, are melted or burned by the plasma bombardment during the long-pul...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01J37/32H05K9/00
CPCH01J37/32431H01J37/32807H05K9/0071H05K9/0073
Inventor 魏会领曹建勇
Owner SOUTHWESTERN INST OF PHYSICS
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com