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Device and semiconductor processing equipment for realizing impedance matching and power distribution

A technology of impedance matching and impedance matching circuits, which is applied in semiconductor/solid-state device manufacturing, impedance network, metal material coating technology, etc., can solve the problems of many components, low integration and high cost, and achieve high integration and reduce The effect of low quantity and cost

Active Publication Date: 2019-10-08
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Depend on figure 1 and figure 2 It can be seen directly that: figure 1 The current distribution circuit in the circuit is composed of a first inductor L1, a first adjustable capacitor C1, a first impedance R1 and a second impedance R2, which requires 4 components; figure 2 The current distribution circuit in the circuit is composed of the second inductance L2, the third impedance R3, the third inductance L3, the second adjustable capacitor C2 and the fourth impedance R4, which requires 5 components, that is to say, the existing current distribution The circuit usually requires 4 to 5 electronic devices (including adjustable capacitors, inductors, and impedances), and there are many components and high cost
In addition, since the current divider and the impedance matching device 10 are two independent parts, they are scattered and the integration degree is low.

Method used

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  • Device and semiconductor processing equipment for realizing impedance matching and power distribution
  • Device and semiconductor processing equipment for realizing impedance matching and power distribution
  • Device and semiconductor processing equipment for realizing impedance matching and power distribution

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Embodiment Construction

[0028] In order for those skilled in the art to better understand the technical solution of the present invention, the device for implementing impedance matching and power distribution and the semiconductor processing equipment provided by the present invention will be described in detail below with reference to the accompanying drawings.

[0029] image 3 A schematic diagram of the structure of the first device for implementing impedance matching and power distribution provided in an embodiment of the present invention applied to a reaction chamber. see image 3 , the first device for realizing impedance matching and power distribution provided by the embodiment of the present invention is applied on the reaction chamber 22, and the reaction chamber 22 includes a dielectric window 27, a gas nozzle 50, a lower electrode base 28, and an inner coil 25 And the outer coil 26, wherein, the gas nozzle 50 is positioned in the reaction chamber 22 through the medium window 27, and is ...

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Abstract

The present invention provides an apparatus for implementing impedance matching and power distribution, and a semiconductor processing device. The apparatus comprises a power distribution circuit and an impedance matching circuit. An input end of the impedance matching circuit is used for being electrically connected to a radio frequency power supply. The power distribution circuit comprises at least two branches, and each branch comprises an upstream end and a downstream end. The upstream end of each branch is connected to an output end of the impedance matching circuit, and the downstream end of each branch is used for being connected to an external component. Each branch is serially connected to a power distribution unit, and the power distribution unit only comprises one first adjustable capacitor. The apparatus and the semiconductor processing device provided in the present invention have low costs, high integration and small volumes.

Description

technical field [0001] The invention belongs to the technical field of microelectronic processing, and in particular relates to a device for realizing impedance matching and power distribution and semiconductor processing equipment. Background technique [0002] Semiconductor equipment usually uses RF power as the plasma excitation source, such as physical vapor deposition equipment, chemical vapor deposition, etc. In order to transfer the power of the RF power to the chamber as completely as possible, it is necessary to connect the RF power and the reaction chamber in series. Connect the impedance matching device to match the input impedance and output impedance of the RF power supply. [0003] figure 1 It is a schematic diagram of the structure of a typical semiconductor device. see figure 1 , the top wall of the reaction chamber 100 is provided with an inner coil 12 and an outer coil 13 respectively corresponding to the central area and the edge area of ​​the reaction ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01J37/32H01J37/34C23C16/54H01L21/67
CPCC23C16/54H01J37/32431H01J37/32807H01J37/3444H01L21/67011H01J37/32H01L21/302H01L21/67H03H7/38
Inventor 成晓阳韦刚卫晶李兴存
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD