Unlock instant, AI-driven research and patent intelligence for your innovation.

Assembly and lithography system holding components in lithography system

A technology for maintaining components and components, applied in microlithography exposure equipment, optical components, optics, etc., can solve problems such as adverse consequences of mirror positioning

Active Publication Date: 2020-09-15
CARL ZEISS SMT GMBH
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The constant flow of electrical current and thus heat sources, with potentially adverse consequences for the positioning of the corresponding mirrors

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Assembly and lithography system holding components in lithography system
  • Assembly and lithography system holding components in lithography system
  • Assembly and lithography system holding components in lithography system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0071] Unless otherwise indicated, identical reference numbers in the figures refer to identical or functionally identical elements. It should also be noted that the illustrations in the drawings are not necessarily to scale.

[0072] Figure 1A A schematic diagram of an EUV lithographic apparatus 100A including a beam shaping and illumination system 102 and a projection system 104 is shown. EUV stands for "extreme ultraviolet" and refers to the wavelengths of working light between 0.1 and 30 nm. The beam shaping and illumination system 102 and the projection system 104 are respectively provided in vacuum enclosures, each vacuum enclosure being evacuated by means of evacuation means (not shown in more detail). The vacuum housing is surrounded by a mechanical chamber (not shown in more detail) in which drive means for mechanically moving or adjusting the optical elements are provided. Electrical controls etc. can also be provided in this mechanical room.

[0073] The EUV litho...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to an assembly (200) for holding a component (M6) in a lithographic system (100), the assembly comprising a gravity compensating device (202) and an adjusting device (400) for exerting a compensating force on the component (M6). Gravity compensating means (202) at least partially compensates the gravitational force acting on the part (M6). Said at least one adjustment means (400) for adjusting the compensating force comprises a first magnet (500) with adjustable permanent magnetization and means (510) for adjusting the permanent magnetization of the first magnet (500).

Description

[0001] Cross References to Related Applications [0002] The content of the priority application DE 10 2015 201 096.1 is hereby incorporated by reference in its entirety. technical field [0003] The invention relates to an arrangement for mounting components in a lithographic apparatus, and to a lithographic apparatus comprising such an arrangement. Background technique [0004] Microlithography is used to manufacture microstructured components, such as integrated circuits. The microlithography process is performed with a lithographic apparatus including an illumination system and a projection system. The image of the mask (reticle) illuminated by the illumination system is in this case projected by a projection system onto a substrate (e.g. wafer) to transfer the mask structure to the photosensitive coating of the substrate. [0005] Driven by the desire for smaller and smaller structures in the manufacture of integrated circuits, EUV lithography apparatuses currently u...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/70825G02B7/182G02B7/1822G02B7/023
Inventor J.韦赛林
Owner CARL ZEISS SMT GMBH