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Monitoring device of etching equipment and etching method

A monitoring device and etching equipment technology, which is applied in the manufacturing of electrical components, electric solid-state devices, semiconductor/solid-state devices, etc., can solve the problems of affecting the etching quality, prone to defective products, difficult to be recognized by the human eye, etc. The effect of improving the etching quality

Inactive Publication Date: 2017-11-17
SHENZHEN CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, during the etching process, particles such as metal residues and photoresist residues are prone to appear on the surface of the substrate to be etched. Etching conditions, prone to defective products, affect the etching quality

Method used

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  • Monitoring device of etching equipment and etching method
  • Monitoring device of etching equipment and etching method
  • Monitoring device of etching equipment and etching method

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Embodiment Construction

[0014] The following will clearly and completely describe the technical solutions of each exemplary embodiment provided by the present invention with reference to the accompanying drawings in the embodiments of the present invention. In the case of no conflict, the following embodiments and technical features thereof can be combined with each other. Moreover, the directional terms used in the following embodiments of the present invention, such as "upper" and "lower", are used to better describe the embodiments, and are not used to limit the protection scope of the present invention.

[0015] see figure 1 , is the monitoring device of the etching equipment according to the first embodiment of the present invention. The monitoring device includes a control system 11 , a sensor 12 and a motion mechanism 13 . The control system 11 can be a PLC (Programmable Logic Controller, programmable logic controller), which is electrically connected to the etching device 20 and used to con...

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Abstract

The invention discloses a monitoring device of etching equipment and an etching method. The monitoring device comprises a control system electrically connected with the etching equipment and a sensor electrically connected with the control system, wherein the sensor aligns to a station for bearing a substrate to be etched and is used for detecting whether the etching pattern of the substrate to be etched meets preset requirements; and the control system is used for controlling the spraying operation of the etching equipment according to a detection result of the sensor. Based on this, the etching condition of the substrate to be etched can be automatically monitored, and the etching quality is improved.

Description

technical field [0001] The invention relates to the technical field of display terminal manufacturing, in particular to a monitoring device and an etching method for etching equipment. Background technique [0002] In the manufacturing process of LCD (Liquid Crystal Display, liquid crystal display), the etching process is a very important part. The etching process uses chemicals to corrode the metal on the surface of the substrate, so as to achieve the purpose of removing part of the metal to form a predetermined pattern. However, during the etching process, particles such as metal residues and photoresist residues are prone to appear on the surface of the substrate to be etched. Etching conditions, prone to defective products, affect the etching quality. Contents of the invention [0003] In view of this, the present invention provides a monitoring device for etching equipment and an etching method, which can automatically monitor the etching status of the substrate to ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/67H01L21/66
CPCH01L21/67011H01L21/67259H01L21/67276H01L22/26H01L2221/67
Inventor 章仟益
Owner SHENZHEN CHINA STAR OPTOELECTRONICS TECH CO LTD