Knife jet apparatus capable of providing uniform fluid water-curtain to substrate
An equipment and liquid knife technology, applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve problems such as hydraulic unevenness, improve fluid pressure unevenness, avoid fluid water curtain bifurcation, and improve etching quality. Effect
Active Publication Date: 2010-12-01
AU OPTRONICS CORP
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Problems solved by technology
The technical problem to be solved by the present invention is to provide a liquid knife device to solve the problem of uneven hydraulic pressure in the prior art
Method used
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The present invention provides a liquid knife device which can provide uniform liquid water curtain to a baseplate and comprises a flow guide device, a first rectifying device and a second rectifying device. The flow guide device comprises a first flow passage and a second flow passage, and the first flow passage and the second flow passage are parallelly arranged and are communicated with each other. The first flow passage is provided with a water filling hole used for inputting liquid. The second flow passage is provided with a water outlet used for discharging the liquid. A cushion space is formed at the position of the communicating between the second flow passage and the first flow passage and is used for temporarily storing the liquid flowing from the first flow passage to the second flow passage. The first rectifying device is used for rectifying the liquid entering into the first flow passage, and the second rectifying device is used for rectifying the liquid entering into thesecond flow passage.
Description
Liquid knife equipment that provides a uniform fluid curtain to the substrate technical field The invention relates to a liquid knife device, in particular to a liquid knife device capable of providing a uniform fluid water curtain to a substrate. Background technique In the manufacturing process of a thin film transistor liquid crystal display device (TFT-LCD), the wet etching process has a very important influence on the display quality of the liquid crystal panel. Generally speaking, wet etching uses a liquid knife device to provide a deionized water or liquid chemical solution water curtain to clean or etch a substrate. Please refer to Figure 1, which is a prior art liquid Schematic diagram of the knife device 10. As can be seen from Fig. 1, the liquid knife device 10 has at least one water injection port 12 (showing 4 in Fig. 1 ) and a water outlet gap 14, the water injection port 12 is used to inject a corresponding fluid for cleaning or etching, and the water outl...
Claims
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IPC IPC(8): G03F7/30H01L21/00
Inventor 陈信全彭显凯
Owner AU OPTRONICS CORP