Photoelectric two-way displacement measurement method

A displacement, photoelectric technology, applied in the field of photoelectric two-way displacement measurement, can solve the problems of low automation, high cost, low work efficiency, etc., and achieve the effect of high test accuracy, low cost and convenient installation
CN107388974BActive Publication Date: 2019-10-15ZHEJIANG HUADONG SURVEYING MAPPING & GEOINFORMATION
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Patent Information

Authority / Receiving Office
CN Β· China
Patent Type
Patents(China)
Current Assignee / Owner
ZHEJIANG HUADONG SURVEYING MAPPING & GEOINFORMATION
Publication Date
2019-10-15

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Abstract

The invention relates to a novel photoelectric bothway displacement measurement method. The technical purpose is to provide the novel photoelectric bothway displacement measurement method which is high in precision, easy in networking, convenient to operate and low in cost and is of a non-contact type. According to the technical scheme, the photoelectric bothway displacement measurement method is characterized in that a first imaging target surface is arranged on a reference point, a second imaging target surface is arranged on a measurement point, a middle point is arranged out of the scope of a connecting line between the reference point and the measurement point, two sets of laser emitters are arranged on the middle point, the laser emitters emit laser beams corresponding to the first imaging target surface and the second imaging target surface respectively, the included angles among the laser beams emitted by the laser emitters are a fixed value, and light spots are formed on the first imaging target surface and the second imaging target surface through the two laser beams respectively. The novel photoelectric bothway displacement measurement method is applicable to measurement of vertical displacement and relatively horizontal displacement variation of two non-contact test points, and measurement of bothway displacement variation of a structural crack.
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Description

Technical field

[0001] The invention relates to a new method for photoelectric bidirectional displacement measurement. It is suitable for measuring the vertical and relative horizontal displacement changes between two non-contact test points, as well as the two-way displacement change measurement of structural cracks. Background technique

[0002] At present, high-precision deformation and displacement are generally measured by instruments or sensors such as level, total station, crack meter, electronic level, etc., and most of them use manual measurement methods. These instruments have high cost, low work efficiency, low automation, many human influence factors, large measurement errors, and cannot realize online monitoring and automatic early warning. Summary of the invention

[0003] The technical problem to be solved by the present invention is to provide a high-precision, non-contact, easy-to-network, convenient operation, and low-cost new photoelectric two-way displacement ...

Claims

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