Substrate heating device
A heating device and substrate technology, applied in nonlinear optics, instruments, optics, etc., can solve problems such as uneven film formation, and achieve the effects of solving uneven film formation, stable and controllable heating curve, and improving baking effect.
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[0018] Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. This invention may, however, be embodied in many different forms and should not be construed as limited to the specific embodiments set forth herein. Rather, the embodiments are provided to explain the principles of the invention and its practical application, thereby enabling others skilled in the art to understand the invention for various embodiments and with various modifications as are suited to particular intended uses. In the drawings, the same reference numerals will be used to denote the same elements throughout.
[0019] refer to figure 1 , the substrate heating device in this embodiment is used to heat a substrate (not marked) coated with PI, which includes a furnace body 1, a substrate 2 disposed in the furnace body 1, and a An intake pipe 3 and an exhaust pipe 4 and a temperature control system 5 communicated with the intake pipe 3 . ...
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