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Substrate processing apparatus, maintenance tool, and maintenance method for substrate processing apparatus

A technology for a substrate processing device and a processing container, which is applied in the manufacturing of semiconductor devices, electric solid-state devices, and semiconductor/solid-state devices, etc., can solve problems such as the inability to detect the height position of lifting pins, and achieve easy detection, fast maintenance, and restraint downtime. Effect

Active Publication Date: 2020-11-24
TOKYO ELECTRON LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this technology cannot detect the height positions of the lift pins of the mounting table one by one

Method used

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  • Substrate processing apparatus, maintenance tool, and maintenance method for substrate processing apparatus
  • Substrate processing apparatus, maintenance tool, and maintenance method for substrate processing apparatus
  • Substrate processing apparatus, maintenance tool, and maintenance method for substrate processing apparatus

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Embodiment Construction

[0065] An embodiment in which the present invention is applied to a plasma etching apparatus as a vacuum processing apparatus will be described. The plasma etching apparatus 100 is configured as a capacitively coupled parallel plate plasma etching apparatus for etching a rectangular substrate G for FPD. Examples of the FPD include a liquid crystal display (LCD), an electroluminescence (EL) display, a plasma display panel (PDP), and the like.

[0066] The plasma etching apparatus 100 has a processing container 1 which is a vacuum container made of aluminum and formed in a rectangular tube shape. The surface of the processing container 1 is subjected to anodic oxidation treatment (aluminum oxide film treatment) as necessary. On the bottom of the processing container 1 , a mounting table 2 serving also as a lower electrode and on which a substrate G is mounted is provided with an insulator 10 interposed therebetween. The mounting table 2 has a main body 21 made of a conductive ...

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PUM

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Abstract

The present invention detects the height positions of the lift pins quickly in a substrate processing apparatus having a plurality of lift pins capable of protruding and sinking from a substrate mounting table for transferring substrates. A device (7) in which a lighting circuit is provided in a container (71) whose bottom is formed to have the same size as the substrate is prepared. The bottom of the container is composed of a circuit board (72). In order to insulate the area (P1) corresponding to one lifting pin (4) from other areas (P2), an insulating material is provided around the area (P1). The two sides of the lighting circuit The ends are respectively connected to the regions (P1, P2). When the device is placed on the mounting table and one lift pin is in contact with the area (P1) and the other lift pin is in contact with the area (P2), the lift pins are electrically connected to each other, so the LED (77) in the device light up. The light at this time is detected by the light detection unit (60), and the servo motor of the lift pin to be adjusted is controlled.

Description

technical field [0001] The present invention relates to detecting and maintaining the height positions of the lift pins in a substrate processing apparatus having a plurality of lift pins capable of protruding and sinking into a substrate mounting table in a processing container for transferring substrates technology field. Background technique [0002] A plurality of lift pins capable of protruding and sinking from a mounting surface of the substrate are provided on a substrate mounting table installed in a processing chamber for performing vacuum processes such as etching and film formation on the substrate. The transfer of the substrate between the stage and the external transfer mechanism is performed by raising and lowering lift pins. During processing of the substrate, the lift pins are accommodated in through holes formed in the stage. [0003] On the other hand, in an apparatus for processing glass substrates for FPD (Flat Panel Display), lift pins are arranged avo...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/67H01L21/683H01L21/02
CPCH01L21/02H01L21/67259H01L21/683H01L2221/67H01L2221/683H01L21/67242H01L21/6835H01L21/68742
Inventor 末木英人三浦知久
Owner TOKYO ELECTRON LTD
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