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Immersion Exchange Apparatus and Method

A technology of exchange device and exchange plate, applied in the field of lithography, can solve the problems of increasing the load of the workpiece table, increasing the speed, and unfavorable movement accuracy.

Active Publication Date: 2020-10-16
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the exchange bridge mode, an exchange bridge plate is flipped up to couple the two workpiece tables to achieve continuous support of the immersion liquid field. Although the exchange time is reduced, the exchange bridge plate will cause shielding around the workpiece table, which is not suitable for interferometers. In the case of position measurement with strip mirrors, and this kind of exchange bridge needs to be equipped with a set of exchange bridges on each workpiece table, it will increase the load on the workpiece table, which is not conducive to the improvement of motion accuracy and speed

Method used

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  • Immersion Exchange Apparatus and Method
  • Immersion Exchange Apparatus and Method
  • Immersion Exchange Apparatus and Method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0057] The present invention provides an immersion exchange device for maintaining the immersion liquid field 4.0 when the immersion liquid is exchanged between the first exposure station 2.1 and the second exposure station, including a manipulator assembly, an exchange plate 5.4 and a The first exchange board interface on stage 2.1 and the second exchange board interface arranged on the second exposure station 2.2; wherein, both the first exchange board interface and the second exchange board interface can refer to the exchange board interface 2.0 shown in the figure Understand that the exchange board interface 2.0 located at the first exposure station 2.1 is the first exchange board interface; the exchange board interface 2.0 located at the second exposure station 2.2 is the second exchange board interface; although it is described as the first and second , it is only for the convenience of description. During the exchange process, the process of the interface between the fir...

Embodiment 2

[0107] Please refer to Figure 19 , the difference between this embodiment and embodiment 1 is:

[0108] In this embodiment, there is no manipulator guide rail existing in embodiment 1 and embodiment 3, the quantity of described manipulator base 5.2 and manipulator arm 5.3 is two groups, and the described manipulator base 5.2 of two groups is fixed on the side of work platform One set of the manipulator base 5.2 and the manipulator arm 5.3 is used to drive to realize the docking of the first exchange board interface / the second exchange board interface with the exchange board 5.4; the other set of the manipulator base 5.2 and the manipulator arm 5.3 is used for Realize the separation of the switch board interface and the switch board.

[0109] In terms of further specific layout design, the difference can be extended and described as:

[0110] Two sets of manipulator bases 5.2 and manipulator arms 5.3 are arranged on the side of the balance mass 3 in the Y-axis direction. The...

Embodiment 3

[0118] Please refer to Figure 20 , the difference between this embodiment and embodiment 1 is:

[0119] In the case where the manipulator rails are arranged, the first exposure station 2.1 is located in the exposure area 1.1 of the workbench, the second exposure station 2.2 is located in the alignment area 1.2 of the workbench, and the exposure area 1.1 is aligned with the Zone 1.2 is distributed along the Y direction, and the manipulator rails are arranged on the side of the worktable along the Y direction. Specifically, the manipulator guide rail 5.1, the manipulator base 5.2, and the manipulator arm 5.3 are arranged on the side of the balance mass 3 in the X-axis direction, and the exchange of the exposure table 2.1 and the exposure table 2.2 will be performed along the Y-axis.

[0120]In summary, the present invention proposes an immersion exchange device and method, which can be applied to the occasions where interferometers or planar gratings are used for position meas...

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Abstract

The invention provides an immersion exchange device and a method. The device comprises a manipulator component, an exchange plate, a first exchange plate interface arranged on a first exposure platform and a second exchange plate interface arranged on a second exposure platform; the first and the second exchange plate interfaces have the same structure; the manipulator component is used for movingand bearing the exchange plate; the exchange plate is used or being moved and abutted to the first exchange plate interface by the manipulator component; after abutting, the exchange plate and the first exposure platform are synchronously driven to move, thus the immersion fluid field is transferred from the exposure zone of the first exposure platform to the exchange plate, and further used forabutting to the second exchange plate interface; after abutting, the exchange plate and the second exposure platform are synchronously driven to move, thus the immersion fluid field is transferred from the exchange plate to the exposure zone of the second exposure platform, so as to expose thereon.

Description

technical field [0001] The invention relates to the field of photolithography, in particular to an immersion exchange device and method. Background technique [0002] The immersion lithography technology needs to be filled with a high refractive index liquid between the lower surface of the last lens of the projection objective lens of the lithography machine and the photoresist on the silicon wafer. The numerical aperture of the projection objective lens NA=nsinθ, where n is the refractive index of the medium between the projection objective lens and the silicon wafer, and θ is the maximum incident angle of light. In the case of the same maximum incident angle, the numerical aperture of the immersion lithography system is n times larger than that of the traditional lithography system. From the perspective of Fourier optics, the numerical aperture plays the role of the threshold of the spatial frequency low-pass filter. Injecting the immersion liquid with high refractive i...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/2041G03F7/70716
Inventor 丛国栋
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD