Photoresistor real-time detection apparatus, photoresistor real-time detection method and photoresistor coating equipment
A technology of real-time detection and optical detection, which is applied in the fields of photoplate-making process coating equipment, optics, nonlinear optics, etc., can solve the problems of inability to monitor in real time, and the risk of missed inspection in random inspection, so as to achieve small impact, improve yield, and eliminate leakage. Check the effect of risk
Inactive Publication Date: 2018-06-15
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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[0010] The purpose of the present invention is to provide a photoresist real-time detection device to solve the problems existing in the prior art that the detection affects the production capacity, there is a risk of missed detection in random inspection, and the problems that cannot be monitored in real time
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[0038] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of them. Based on the implementation manners in the present invention, all other implementation manners obtained by persons of ordinary skill in the art without making creative efforts belong to the scope of protection of the present invention.
[0039] The invention provides a photoresist coating device, which includes a photoresist real-time detection device, capable of real-time detection of photoresist compliance when coating the photoresist, saving man-hours and not affecting productivity.
[0040] see Figure 1 to Figure 3 , figure 1 It is a top view structure schematic diagram of a photoresist real-time detection device according to an embodiment of the pres...
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The invention provides a photoresistor real-time detection apparatus. The photoresistor real-time detection apparatus comprises a working table, a substrate placed on the working table and a metal-opening tool, wherein the metal-opening tool is used for coating the photoresistor on the substrate; the working table is also provided with an optical detection part and a control part electrically connected with the optical detection part; and when the metal-opening tool coats the photoresistor on the substrate in the first direction, the optical detection part performs detection on the photoresistor and feedbacks a detection signal to the control part, and the control part makes comparison between the detection signal and a standard signal to determine whether the photoresistor is qualified ornot. According to the photoresistor real-time detection apparatus provided by the invention, the photoresistor can be detected in real time by means of setting the optical detection part, performingphotoresistor detection when the metal-opening tool coats the photoresistor, enabling the optical detection part to feedback the detection signal to the control part and by making comparison between the detection signal and the standard signal through the control part, so that risk of leak detection existing in a spot check mode can be solved, the product yield is improved, and little influence iscaused to capacity. The invention also provides a photoresistor real-time detection method and photoresistor coating equipment.
Description
technical field [0001] The invention belongs to the technical field of photoresist coating, and in particular relates to a photoresist real-time detection device, a photoresist real-time detection method and photoresist coating equipment. Background technique [0002] At present, in the photoresist coating process of the liquid crystal panel industry, a coating machine is often used to coat the substrate with photoresist. In order to ensure the yield rate of mass production, the photoresist coating process needs to be inspected and monitored in the following three aspects: [0003] 1. In the actual mass production, when the coating machine needs to be restarted every time after maintenance, it is necessary to coat the photoresist on the substrate first, and then use the film thickness machine to measure the thickness of the photoresist coated on the substrate, and then confirm the photoresist Whether the overall uniformity of thickness is within the specification; [0004]...
Claims
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IPC IPC(8): G03F7/16G02F1/13
CPCG02F1/1303G03F7/16
Inventor 张瑞军莫超德范志翔刘文波孟小龙王松
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD