Production device of ultraviolet negative photoresist for integrated circuit
A technology of negative photoresist and integrated circuit, which is applied in the field of production equipment of integrated circuit ultraviolet negative photoresist, and can solve problems such as complex production equipment
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example 1
[0008] Production raw materials and dosage
[0009]
[0010] The production equipment of integrated circuit ultraviolet negative photoresist mainly includes: sol kettle (D101), cyclization kettle (D102), freezer (L101), glue mixing kettle (D103), filter (L102), 100-level super Clean room (L103), wherein, the cyclization kettle (D102) is connected with the sol kettle (D101) and the freezer (L101) respectively, and the filter (L102) is connected with the glue mixing kettle (D103) and the 100-class ultra-clean room ( L103) are connected, among which, the nominal volume of the sol kettle (D101) is 420L, the diameter of the inner pot of the cyclization kettle (D102) is 850mm, and the filter membrane pore size of the class 100 ultra-clean room (L103) is 0.11μm.
[0011] The production device of integrated circuit UV negative photoresist, the production process is as follows: add polyisoprene and xylene into the sol kettle D101, stir at 30°C to fully dissolve the polyisoprene. Th...
example 2
[0015] Production raw materials and dosage
[0016]
[0017]
[0018] The production equipment of integrated circuit ultraviolet negative photoresist mainly includes: sol kettle (D101), cyclization kettle (D102), freezer (L101), glue mixing kettle (D103), filter (L102), 100-level super Clean room (L103), wherein, the cyclization kettle (D102) is connected with the sol kettle (D101) and the freezer (L101) respectively, and the filter (L102) is connected with the glue mixing kettle (D103) and the 100-class ultra-clean room ( L103) are connected, among which, the nominal volume of the sol kettle (D101) is 450L, the diameter of the inner pot of the cyclization kettle (D102) is 900mm, and the filter membrane pore size of the class 100 ultra-clean room (L103) is 0.12μm.
[0019] The production device of integrated circuit UV negative photoresist, the production process is as follows: add polyisoprene and xylene into the sol kettle D101, stir at 36°C to fully dissolve the polyi...
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