Production device of high-strength material silicon carbide ceramic

A technology for silicon carbide ceramics and production equipment, which is applied in the field of production equipment for high-strength material silicon carbide ceramics, and can solve problems such as complex production equipment

Inactive Publication Date: 2018-07-03
CHENGDU MENG TE SI TECH CO LTD
View PDF0 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Most of the existing production devices are relatively complicated. High-strength material silicon carbide ceramics is an excellent non-oxide ceramic. The pros and cons of its production devices have important economic significance for improving product quality and reducing by-product content.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Production device of high-strength material silicon carbide ceramic
  • Production device of high-strength material silicon carbide ceramic
  • Production device of high-strength material silicon carbide ceramic

Examples

Experimental program
Comparison scheme
Effect test

example 1

[0008] Production raw materials and dosage

[0009]

[0010] The production device of high-strength material silicon carbide ceramics mainly includes: vacuum pump (J101), buffer tank (F101), and combustion furnace (B101). The connection relationship between the various components of the production device is: vacuum pump (J101) and buffer tank ( F101) is connected, the buffer tank (F101) is connected with the combustion furnace (B101), in which, the diameter of the water inlet of the vacuum pump (J101) is 170mm, and the nominal volume of the buffer tank (F101) is 1.8m 3 , The height of the cone bottom of the buffer tank (F101) is 370mm.

[0011] The production equipment of high-strength material silicon carbide ceramics, the production process is: add silicon carbide raw material powder to alumina, under 1900 ° C and 330 MPa pressure, hot press sintering reaction in B101 for 1 hour, and then reduce the temperature to 30 ° C within 90 minutes. Get the finished product.

[0...

example 2

[0015] Production raw materials and dosage

[0016]

[0017] The production device of high-strength material silicon carbide ceramics mainly includes: vacuum pump (J101), buffer tank (F101), and combustion furnace (B101). The connection relationship between the various components of the production device is: vacuum pump (J101) and buffer tank ( F101) is connected, and the buffer tank (F101) is connected with the combustion furnace (B101), among which, the diameter of the water inlet of the vacuum pump (J101) is 180mm, and the nominal volume of the buffer tank (F101) is 1.9m 3 , The height of the cone bottom of the buffer tank (F101) is 380mm.

[0018] The production equipment of high-strength material silicon carbide ceramics, the production process is: add silicon carbide raw material powder to alumina, under 1980 ° C and 340 MPa pressure, hot press sintering reaction in B101 for 2 hours, and then reduce the temperature to 35 ° C within 130 min. Get the finished product. ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
heightaaaaaaaaaa
heightaaaaaaaaaa
Login to view more

Abstract

The invention discloses a production device of a high-strength material silicon carbide ceramic. The production device mainly comprises a vacuum pump (J101), a buffer tank (F101) and a combustion furnace (B101). The vacuum pump (J101) is connected to the buffer tank (F101) and the buffer tank (F101) is connected to the combustion furnace (B101). The water inlet of the vacuum pump (J101) has the diameter of 170 to 180 mm.

Description

technical field [0001] The invention relates to a compound synthesis device, in particular to a production device of high-strength material silicon carbide ceramics. Background technique [0002] Silicon carbide ceramics, a high-strength material, are mainly used in nozzles, bearings, turbocharger rotors, static and moving blades of gas turbines, heat exchangers, etc. in the industrial sector. Not only has excellent room temperature mechanical properties, high bending strength, excellent oxidation resistance, good corrosion resistance, high wear resistance and low friction coefficient, but also high temperature mechanical properties are the best among known ceramic materials. The high temperature strength of hot pressing sintering, pressureless sintering and hot isostatic pressing sintering can be maintained up to 1600°C, which is the best high temperature strength material among ceramic materials, and the oxidation resistance is also the best among all non-oxide ceramics ....

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C04B35/565C04B35/622C04B35/645
CPCC04B35/565C04B35/622C04B35/645C04B2235/3217C04B2235/6565C04B2235/6567C04B2235/77C04B2235/96
Inventor 彭飞
Owner CHENGDU MENG TE SI TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap