Suspended graphene propagation plasmon waveguide device and preparation method thereof

A plasmonic waveguide, graphene technology, applied in the field of plasmonics, can solve problems such as dielectric loss and high attenuation rate

Active Publication Date: 2018-08-21
THE NAT CENT FOR NANOSCI & TECH NCNST OF CHINA
View PDF6 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, graphene plasmons have a high attenuation rate, which mainly comes from two aspects: one is that the electrons in graphene are scattered by phonons, and the other is the dielectric loss of the dielectric environment around the plasmon polarization.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Suspended graphene propagation plasmon waveguide device and preparation method thereof
  • Suspended graphene propagation plasmon waveguide device and preparation method thereof
  • Suspended graphene propagation plasmon waveguide device and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0036] The objects and functions of the present invention and methods for achieving the objects and functions will be clarified by referring to the exemplary embodiments. However, the present invention is not limited to the exemplary embodiments disclosed below; it can be implemented in various forms. The essence of the description is only to help those skilled in the relevant art comprehensively understand the specific details of the present invention.

[0037] Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. In the drawings, the same reference numerals represent the same or similar components, or the same or similar steps.

[0038] see Figure 1a , Figure 1b , the present invention provides a suspended graphene propagating plasmonic waveguide device 100, which device includes: a substrate 101, a graphene layer 103 and an electrode 107 arranged in sequence from bottom to top; the substrate 101 includes at leas...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
sizeaaaaaaaaaa
pore sizeaaaaaaaaaa
thicknessaaaaaaaaaa
Login to view more

Abstract

The present invention provides a suspended graphene propagation plasmon waveguide device. The suspended graphene propagation plasmon waveguide device comprises a substrate, a graphene layer and an electrode which are disposed sequentially from bottom to top; the substrate comprises at least one hole structure and is used for supporting a graphene layer and an electrode; the graphene layer covers the hole structure of the substrate, so that a suspended graphene structure can be formed; and the electrode is used for electrical measurement and electrostatic regulation of graphene carrier concentration and is arranged on the graphene layer. According to the structure of the suspended graphene propagation plasmon waveguide device of the invention, propagation plasmons are supported on the suspended graphene structure; with such kind of structure adopted, the dielectric loss of the graphene plasmons can be effectively eliminated, and the decay rate of the plasmons can be reduced; and since the dielectric constant of the air is small, the wavelength of the plasmons on the suspended graphene is very long, and a long-wavelength propagation distance can be achieved with the low attenuation characteristic of the plasmons utilized.

Description

technical field [0001] The invention relates to the field of surface plasmons, in particular to a suspended graphene propagating plasmon device and a preparation method thereof. Background technique [0002] Graphene is a single atomic layer two-dimensional material composed of carbon atoms in a hexagonal honeycomb lattice structure, which has good electrical properties, including high carrier mobility, bipolar carrier characteristics and easy Tuned carrier concentration, etc. In addition, graphene has excellent mechanical properties, so it can support the stable existence of suspended graphene structures. [0003] The plasmons of electronic harmonic resonance on graphene can localize the energy of the incident light field on the surface of graphene, forming plasmon modes that propagate along the surface of graphene. Such plasmons have excellent properties of high local field confinement and easy tuning. However, graphene plasmons have a high decay rate, which mainly come...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): H01P3/00H01P11/00
CPCH01P3/00H01P11/001
Inventor 戴庆胡海杨晓霞胡德波刘梦昆郭相东
Owner THE NAT CENT FOR NANOSCI & TECH NCNST OF CHINA
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap