Method for manufacturing high-brightness low-attenuation LEDs
A technology of light-emitting diodes and manufacturing methods, which is applied to electrical components, circuits, semiconductor devices, etc., can solve problems such as inappropriate selection of baking temperature and time, low brightness of light-emitting diodes, and improper color matching, so as to improve light extraction efficiency, Improve the service life and brightness, low attenuation effect
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[0029] A method for manufacturing a high-brightness and low-attenuation LED light-emitting diode, the method comprising the following steps:
[0030] ①. First, take the silicon carbide substrate, place the silicon carbide substrate in a metal-organic chemical vapor deposition wafer furnace, and fabricate gallium nitride LED crystal epitaxial wafers on the silicon carbide substrate.
[0031] The metal-organic chemical vapor deposition wafer furnace uses gas phase reactants, organic metals of group III and NH3 of group V to react on the surface of the silicon carbide substrate, and deposits gallium nitride on the surface of the silicon carbide substrate. By controlling the temperature , pressure, reactant concentration and ratio, so as to control its composition and crystal phase quality, and then produce GaN LED crystal epitaxial wafers with good integrity, high conductivity and good thermal conductivity.
[0032] ②. After the fabrication of the GaN LED crystal epitaxial wafer ...
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