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Shadow frame

A shadow frame and frame strip technology, which is applied in gaseous chemical plating, metal material coating process, coating and other directions, can solve the problems of unsatisfactory shielding effect of deposition materials, strengthening, affecting the quality of the deposited film layer on the substrate, etc. The occlusion effect is not ideal, strengthen the fixed effect

Active Publication Date: 2018-11-02
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The invention provides a shadow frame, which reinforces the screws used to fix the L-shaped sheet, strengthens the fixing of the L-shaped sheet, and solves the unsatisfactory shielding effect of the deposition material caused by the offset of the L-shaped sheet, which affects the deposition of the substrate Technical issues of film quality

Method used

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Embodiment Construction

[0031] The following descriptions of the various embodiments refer to the accompanying drawings to illustrate specific embodiments in which the invention may be practiced. The directional terms mentioned in the present invention, such as [top], [bottom], [front], [back], [left], [right], [inside], [outside], [side], etc., are only for reference The orientation of the attached schema. Therefore, the directional terms used are used to illustrate and understand the present invention, but not to limit the present invention. In the figures, structurally similar elements are denoted by the same reference numerals.

[0032] The present invention is aimed at the shadow frame of the existing prior art, the fixing effect of the L-shaped sheet is not ideal, and the firmness of the L-shaped sheet will be affected by the process action, which will lead to the deviation of the L-shaped sheet, and finally lead to an unsatisfactory shielding effect of the deposited material , affecting the ...

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Abstract

The invention provides a shadow frame which is used for covering an area, not requiring a deposition material, on the edge of a base plate when a thin film is deposited on the surface of the base plate. The shadow frame comprises a main frame body, a covering frame, and L-shaped thin sheets, wherein the main frame body comprises multiple frame strips butted end to end sequentially; the covering frame comprises multiple strip-shaped ceramic plates butted end to end sequentially; the strip-shaped ceramic plates are arranged on the surfaces of the corresponding frame strips; the L-shaped thin sheets are arranged on the surfaces of the strip-shaped ceramic plates, are used for covering gaps produced on connecting parts between adjacent frame strips, and are fixed to the surfaces of the strip-shaped ceramic plates through screws; and fasteners are arranged for matching with the screws so as to reinforce the fixation on the L-shaped thin sheets. The shadow frame provided by the invention hasthe beneficial effects that the screws for fixing the L-shaped thin sheets are reinforced, so that the fixation on the L-shaped thin sheets is reinforced, and the technical problems that a covering effect on the deposition material is not ideal and the quality of a base plate deposited film layer is influenced since the L-shaped thin sheets are deviated due to unfirm fixation are solved.

Description

technical field [0001] The present invention relates to the field of display device manufacturing, and in particular to a shadow frame used for shielding areas on the edge of a substrate where no material to be deposited is used in a chemical vapor deposition process. Background technique [0002] In terms of flat panel display and transistor fabrication, metal interconnection and other characteristics are formed by depositing multiple layers of conductive metal layers, semiconductors and dielectric materials on the substrate. Substrate processing technologies include plasma enhanced chemical vapor deposition (Pecvd, Plasma Enhanced Chemical Vapor Deposition), physical vapor deposition (Pvd, Physical Vapor Deposition), etching and the like. Plasma processing is particularly well suited for the production of flat panel displays because of the relatively low processing temperatures required to deposit good quality thin films. [0003] In general, plasma processing techniques ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/04
CPCC23C16/045
Inventor 张文鹏
Owner SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD