Reeling device for atomic layer deposition based continuous double-sided coating film

Abstract

The invention discloses a reeling device for atomic layer deposition based continuous double-sided coating film. The reeling device comprises a box body divided into a first area, a second area and athird area inside sequentially; unreeling rolls, first transitional rolls, a first gas inlet system and a first heater are arranged in the first area, a second gas inlet system is arranged in the second area, reeling rolls, second transitional rolls, a third gas inlet system and a second heater are arranged in the second area; the unreeling rolls and the reeling rolls are respectively used for unreeling and reeling a base band; the first transitional rolls and the second transitional rolls are used for supporting direction-changing position of the base band; the first gas inlet system, the second gas inlet system, and the third gas inlet system all extend into an gas homogenizing pipe; and the first area, the second area and the third area in the box body are provided with gas outlets respectively. With the gas homogenizing pipe, gas is distributed uniformly when introducing into the box body, so that reaction efficiency is improved and the atomic layer deposition is more uniform.

Description

technical field [0001] The invention relates to the technical field of atomic layer deposition, in particular to a winding device for atomic layer deposition continuous double-sided coating. Background technique [0002] Atomic layer deposition (ALD for short) is a method that can coat substances layer by layer on the surface of a substrate in the form of a single atomic film. Atomic layer deposition is similar to ordinary chemical deposition. But in ALD, the chemical reaction of a new atomic film is directly linked to the previous one, in such a way that only one layer of atoms is deposited per reaction. [0003] In recent years, due to the demand for the preparation of nano-devices, ALD has gradually attracted the attention of the industry, and more and more research investment has been made. ALD uses the self-limiting reaction between the precursor gas and the surface of the substrate and the monolayer chemical adsorption on the collective surface, the reaction gas does...

AI Technical Summary

Problems solved by technology

[0006] In the existing technology, although the atomic layer deposition system can realize the coating of the baseband, it cannot guarantee the tension of the baseband and the uniformity of the coating, and the coating accuracy is not high

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