Reeling device for atomic layer deposition based continuous double-sided coating film
An atomic layer deposition, double-sided coating technology, applied in coating, gaseous chemical plating, metal material coating process, etc., can solve the problems of low coating accuracy, can not guarantee the uniformity of baseband tension coating, etc., to improve the reaction Efficiency, uniform effect of atomic layer deposition
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[0027] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0028] The purpose of the present invention is to provide a winding device for atomic layer deposition continuous double-sided coating, which is used to realize intermittent double-sided coating of baseband, complete large-area atomic layer deposition, and improve the uniformity of coating.
[0029] In order to make the above objects, features and advantages of the present invention more comprehensible, the present invention will be further described in detail ...
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