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Plasma treatment device

A plasma and processing device technology, applied in the field of plasma processing devices, can solve problems that cannot be solved, without considering the formation of gaps and the suppression of abnormal discharges, etc.

Active Publication Date: 2020-07-07
TOKYO ELECTRON LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, neither Patent Document 2 nor Patent Document 3 considers the formation of a gap between members constituting the ring member and the suppression of abnormal discharge, and cannot solve the problem of the present invention.

Method used

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  • Plasma treatment device
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Embodiment Construction

[0039] Hereinafter, embodiments of the present invention will be described with reference to the drawings. In addition, in this specification and the drawings, components having substantially the same configuration are denoted by the same reference numerals, and overlapping descriptions will be omitted. figure 1 It is a longitudinal cross-sectional side view which shows one Embodiment of the plasma processing apparatus 1 of this invention. The plasma processing apparatus 1 is configured as a plasma processing apparatus that generates inductively coupled plasma and performs inductively coupled plasma processing such as etching processing and ashing processing on a quadrangular substrate such as a G6 half substrate. The G6 half substrate refers to a substrate in which the length of the long side of a G6 size (1500mm×1850mm) substrate is divided into half, and is applied to, for example, an organic EL display using an organic light emitting diode (OLED: Organic Light Emitting Dio...

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Abstract

According to the present invention, when a plurality of substrates are arranged and placed on the lower electrode for plasma processing, the occurrence of abnormal discharge in the lower electrode is suppressed. In the lower electrode (4) in which a plurality of, for example, two substrates (G) are placed side by side, the strip-shaped ring part (6) will be formed when viewed on the circuit route around the four sides of the substrate (G) in a clockwise or counterclockwise direction. The members ( 61 to 67 ) are arranged such that the side surface of the front end of the belt-shaped member on the rear side is in contact with the rear end surface of the belt-shaped member on the front side. Two belt-shaped members (horizontal members) arranged on a straight line in the lateral direction in a manner of being in contact with the rear end faces of the belt-shaped members (longitudinal members) provided as the boundary region (44) between the two substrates ( 63, 67) between the end surfaces, there is formed a gap for absorbing the expansion of the transverse member due to heat. Since the lower electrode is not exposed from the gap, even if plasma enters the gap, occurrence of abnormal discharge can be suppressed.

Description

technical field [0001] The present invention relates to a plasma processing apparatus in which a quadrangular substrate is placed on a lower electrode surrounded by a ring portion made of an insulating member over the entire circumference at least on the upper side surface, and the substrate is processed by plasma. Background technique [0002] In the manufacture of a flat panel display (FPD) such as a liquid crystal display device (LCD), a plasma treatment gas such as an etching treatment and a film-forming treatment is performed by supplying a plasma treatment gas to a glass substrate serving as a substrate to be treated. For example, the plasma processing is performed in a state where the substrate is mounted on a mounting table provided in a processing container in which a vacuum atmosphere is formed. The mounting table is formed in, for example, a square cylinder shape, and an insulating ring member called a focus ring or the like is provided on the outer peripheral por...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01J37/32
CPCH01J37/32082H01J37/32541H01J37/32559H01J37/32568H01J2237/334H01J37/32623H01J37/32532
Inventor 南雅人佐佐木芳彦
Owner TOKYO ELECTRON LTD