Chemical tank device
A chemical liquid and tank technology, which is applied in the manufacture of electrical components, circuits, semiconductors/solid-state devices, etc., can solve the problems of time-consuming, wafer resources, and low efficiency, and achieve the effects of improving efficiency and saving time
Active Publication Date: 2020-12-11
YANGTZE MEMORY TECH CO LTD
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Problems solved by technology
The above process will consume a lot of time and wafer resources, and the efficiency is low
Method used
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[0019] The specific implementation of the chemical liquid tank device provided by the present invention will be described in detail below in conjunction with the accompanying drawings.
[0020] Please refer to figure 1 , is a specific embodiment of a chemical liquid tank device according to a specific embodiment of the present invention.
[0021] The chemical liquid tank device includes: a chemical liquid tank body 100, a circulation unit and a concentration adjustment unit.
[0022] The chemical liquid tank 100 is used to contain chemical liquid. In this specific embodiment, the chemical liquid is phosphoric acid. In other specific embodiments, the chemical liquid can also be other wet etching solutions or cleaning solutions such as hydrofluoric acid, which are used for wet etching the wafer 130 placed in the chemical liquid tank 100 or rinse.
[0023] The circulation unit includes a circulation pipeline 110 connected to the chemical liquid tank, one end of the circulatio...
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The invention relates to a chemical liquid tank device, comprising: a chemical liquid tank body, which is used for containing chemical liquid; Circulation unit, includes a circulating line connectingthe chemical liquid tank body, one end of the circulating pipeline is connected to the solution output end of the chemical liquid tank body, and the other end is connected to a nozzle in the chemicalliquid tank body, the chemical liquid flows out from the solution output end of the chemical liquid tank body, passes through the circulating pipeline and enters the chemical liquid tank body throughthe nozzle. The concentration adjusting unit comprises a branch pipeline, wherein an input end and an output end of the branch pipeline are respectively connected to the circulation pipeline through athree-way valve, an ion source container is arranged on the path of the branch pipeline, and two ends of the ion source container are communicated with the branch pipeline for placing ion source substances. The chemical liquid tank device can automatically adjust the impurity ion concentration in the chemical liquid.
Description
technical field [0001] The invention relates to the technical field of semiconductors, in particular to a chemical liquid tank device. Background technique [0002] In the phosphoric acid etching process in the semiconductor process, the concentration of Si in the phosphoric acid solution in the phosphoric acid tank needs to be kept within a certain range to maintain a stable etching rate. As the corrosion process progresses, the concentration of Si in phosphoric acid will change, so it is necessary to adjust the concentration of Si in the phosphoric acid solution by certain means to control the concentration of Si within a certain range. [0003] In the prior art, the Si concentration in the phosphoric acid solution can be reduced by replacing a new phosphoric acid solution, or the Si concentration in the phosphoric acid solution can be increased by dissolving the SiN layer on the wafer surface, so that the Si concentration in the phosphoric acid solution can be stabilized....
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IPC IPC(8): H01L21/67H01L21/306
CPCH01L21/30604H01L21/67075H01L21/67253H01L21/67265
Inventor 苏界徐融顾立勋杨永刚蒋阳波孙文斌
Owner YANGTZE MEMORY TECH CO LTD