Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Novel new material plate automatic cleaning equipment in field of material machining

A material processing and automatic cleaning technology, applied in the direction of cleaning methods using liquids, cleaning methods and utensils, chemical instruments and methods, etc., can solve the problems of inability to meet diverse cleaning needs, high labor intensity, and low cleaning efficiency , to achieve the effect of diversified cleaning methods, low labor intensity, and meeting the needs of cleaning

Inactive Publication Date: 2019-02-01
SHENZHEN LEYE TECH CO LTD
View PDF9 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] Dust will be deposited on the surface of the new material board during use or production, which will affect the use of the new material board, so it needs to be cleaned
The general cleaning method is mainly carried out manually. Manual cleaning is labor-intensive, cumbersome to operate, and the cleaning efficiency is low, and the cleaning is not clean enough. Although some cleaning devices have appeared, it is impossible to clean the upper and lower surfaces of the new material board at the same time. , the cleaning efficiency is low, the cleaning is not clean enough, and the cleaning method is single, which cannot meet the diverse cleaning needs

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Novel new material plate automatic cleaning equipment in field of material machining

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0009] A clear and complete description will be given below of the new material plate automatic cleaning equipment in the material processing field of the present invention in conjunction with the accompanying drawings.

[0010] Such as figure 1 As shown, the novel new material plate automatic cleaning equipment in the material processing field of the present invention includes a frame device 1, an agitating device 2 arranged on the frame device 1, a support device 3 accommodated in the frame device 1, The connection device 4 located on the right side of the support device 3, the positioning device 5 provided on the connection device 4, the cleaning device 6 located on the left side of the positioning device 5, the driving device provided on the frame device 1 device7.

[0011] Such as figure 1 As shown, the frame device 1 includes a frame body 11, a first roller 12 arranged on the frame body 11, a first positioning rod 13 accommodated in the frame body 11, and is located on...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses novel new material plate automatic cleaning equipment in the field of material machining. The equipment comprises a frame body device, a stirring device, a supporting device, aconnecting device, a positioning device, a cleaning device and a driving device, wherein the stirring device is arranged on the frame body device, the supporting device is contained in the frame bodydevice, the connecting device is arranged on the right side of the supporting device, the positioning device is arranged on the connecting device, the cleaning device is arranged on the left side ofthe positioning device, and the driving device is arranged on the frame body device. According to the equipment, the upper surface and the lower surface of the new material plate can be simultaneouslycleaned, the cleaning efficiency is high, the operation is simple, so that the labor intensity is low; the full flow of water in a frame body can be realized, and the cleaning of the new material plate by the water can be promoted, dust impurities on the surface of the new material plate can be cleared up; and meanwhile, the up-and-down flowing of the water in a lifting frame can be realized, sothat the water in the lifting frame can be pressed, the water can be quickly sprayed onto the new material plate, and cleaning of the lower surface of the new material plate is facilitated.

Description

technical field [0001] The invention relates to the technical field of material processing, in particular to a new type of automatic cleaning equipment for new material plates in the field of material processing. Background technique [0002] Dust will be deposited on the surface of the new material board during use or production, which will affect the use of the new material board, so it needs to be cleaned. The general cleaning method is mainly carried out manually. Manual cleaning is labor-intensive, cumbersome to operate, and the cleaning efficiency is low, and the cleaning is not clean enough. Although some cleaning devices have appeared, it is impossible to clean the upper and lower surfaces of the new material board at the same time. , the cleaning efficiency is low, the cleaning is not clean enough, and the cleaning method is single, which cannot meet the diverse cleaning needs. [0003] Therefore, it is necessary to provide a new technical solution to overcome the ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B08B3/02B08B3/04B08B3/10B08B13/00
CPCB08B3/022B08B3/041B08B3/10B08B13/00
Inventor 刘殿坤
Owner SHENZHEN LEYE TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com