Anti-allergic repair facial mask and preparation method thereof

A technology for facial masks and essences, which is applied in the fields of pharmaceutical formulas, cosmetic preparations, dressing preparations, etc. It can solve the problems of complex formula components, expensive raw material sources, skin damage, etc., achieve excellent anti-inflammatory and anti-irritant effects, and improve self-efficacy. Repair ability, delay skin aging effect

Inactive Publication Date: 2019-02-22
广州秉科医药科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the mask stickers currently on the market are all soaked out of chemical agents. The use of chemical agents further increases the chance of skin allergies as the body's defense barrier, and the efficacy is poor. Sensitive skin is not suitable for use.
If the raw materials of plant active ingredients are used, it can not only enhance the skin barrier function but also reduce the burden of skin repair, but the disadvantage is that the source of raw materials is expensive. In order to save costs, some manufacturers will add other less effective and irritating ingredients instead of plant ingredients, resulting in more Severe skin damage; at present, many natural skin care masks have complex formula components, which is not conducive to industrial scale-up production, and has no targeted effect on skin repair

Method used

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  • Anti-allergic repair facial mask and preparation method thereof
  • Anti-allergic repair facial mask and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0037]An anti-allergic and repairing mask essence, said mask essence comprises the following components in parts by weight: 1 part of redness-removing factor, 70 parts of water, 1 part of glycerin, 0.05 part of macromolecular hyaluronic acid, and middle molecular hyaluronic acid 0.05 parts, small molecule hyaluronic acid 0.05 parts, oligopeptide-10.01 parts, palmitoyl pentapeptide-51 parts, 1,2-hexanediol 0.2 parts, glyceryl caprylate 0.3 parts, tree peony root bark extract 0.1 parts, 0.1 part of sclerotinium, 1 part of propylene glycol and 1 part of glycerin.

[0038] A preparation method for anti-allergic repairing medical mask essence, comprising the following steps:

[0039] (1) First add water, propylene glycol and sclerotinia to the pot and stir for 15 minutes, heat to 80°C, keep warm for 30 minutes, and sterilize by microwave;

[0040] (2) Lower the temperature. When the temperature drops to 40°C, add glycerin, macromolecular hyaluronic acid, medium molecular hyaluroni...

Embodiment 2

[0045] An anti-allergic repairing facial mask essence, said anti-allergic repairing facial mask essence comprises the following components in parts by weight: 8 parts of redness-removing factor, 100 parts of water, 10 parts of propylene glycol, 2 parts of sclerotinum, and 10 parts of glycerin , 0.3 parts of macromolecular hyaluronic acid, 0.3 parts of medium molecular hyaluronic acid, 0.4 parts of small molecular hyaluronic acid, 10.3 parts of oligopeptide, 57 parts of palmitoyl pentapeptide, 4 parts of 1,2-hexanediol, glycerin Caprylic acid ester 4 parts and peony root bark extract 5 parts.

[0046] A preparation method for anti-allergy repair mask essence, comprising the following steps:

[0047] (1) First add water, propylene glycol and sclerotinia to the pot and stir for 15 minutes, heat to 80°C, keep warm for 30 minutes, and sterilize by microwave;

[0048] (2) Lower the temperature. When the temperature drops to 40°C, add glycerin, macromolecular hyaluronic acid, medium...

Embodiment 3

[0053] An anti-allergic repairing facial mask essence, said anti-allergic repairing facial mask essence comprises the following components in parts by weight: 2 parts of redness-removing factor, 75 parts of water, 5 parts of propylene glycol, 0.2 part of sclerotinia glue, 3 parts of glycerin , 0.1 part of macromolecular hyaluronic acid, 0.1 part of medium molecular hyaluronic acid, 0.1 part of small molecular hyaluronic acid, 10.05 parts of oligopeptide, 51 parts of palmitoyl pentapeptide, 0.5 part of 1,2-hexanediol, glycerin Caprylic acid ester 0.5 part and Moutan root bark extract 1 part.

[0054] A preparation method for anti-allergy repair mask essence, comprising the following steps:

[0055] (1) First add water, propylene glycol and sclerotinia to the pot and stir for 15 minutes, heat to 80°C, keep warm for 30 minutes, and sterilize by microwave;

[0056] (2) Lower the temperature. When the temperature drops to 40°C, add glycerin, hyaluronic acid, oligopeptide-1, and pa...

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PUM

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Abstract

The invention discloses an anti-allergic repair facial mask. The anti-allergic repair facial mask is composed of anti-allergic repair facial mask essence and a facial mask cloth, wherein the anti-allergic repair facial mask is composed of, by weight part, 1-8 parts of red-cleaning factors, 70-100 parts of water, 0.15-1 part of hyaluronic acid, 0.01-0.3 part of oligopeptide-1, 1-7 parts of palmitoyl pentapeptide-5, 0.5-8 parts of preservatives, 0.1-5 parts of peony root bark extract, 0.1-2 parts of scleroticum gum, 1-10 parts of propylene glycol and 1-8 parts of glycerol. A large number of experiments conclude that, by compounding the red-cleaning factors, the oligopeptide-1, the palmitoyl pentapeptide-5, the scleroticum gum and the peony root bark extract, the anti-allergic repair facial mask can give maximized play to the effects of the hyaluronic acid of different molecular sizes,, and meanwhile, enhance the repair effects of peptides and ensure comprehensive anti-allergic effects, thereby being effective to hormone face.

Description

technical field [0001] The invention relates to the field of cosmetics, in particular to an anti-allergy repairing facial mask and a preparation method thereof. Background technique [0002] The principle of the mask is to use the short time covered on the face to temporarily isolate the outside air and pollution, increase the temperature of the skin, expand the pores of the skin, promote the secretion and metabolism of sweat glands, and increase the oxygen content of the skin. The mask is good for the skin to eliminate The products of epidermal cell metabolism and accumulated oily substances, the moisture in the mask penetrates into the stratum corneum of the skin epidermis, and the skin becomes soft and elastic. However, the mask stickers currently on the market are all soaked in chemical preparations. The use of chemical preparations further increases the chance of skin allergies as a defense barrier of the human body, and the efficacy is poor. Sensitive skin is not suita...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/9789A61K8/34A61K8/37A61K8/64A61K8/73A61Q19/00A61Q19/08
CPCA61K8/345A61K8/347A61K8/375A61K8/64A61K8/73A61K8/735A61K2800/592A61K2800/5922A61Q19/00A61Q19/005A61Q19/08A61K8/9789
Inventor 唐建忠刘家玲康雄江
Owner 广州秉科医药科技有限公司
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