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Marker-free far-field super-resolution microscopy system and method based on super-resolution lens

A microscopic system and super-resolution technology, applied in the field of visible light microscopy, can solve the problems of restricting resolution and achieve the effect of rapid acquisition

Active Publication Date: 2020-11-03
CHONGQING UNIV
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Problems solved by technology

In recent years, there have been a few experimental reports on label-free far-field super-resolution microscopy based on super-diffraction devices. However, such systems only use super-diffraction devices to achieve super-resolution illumination, and their collection lenses still use traditional optical microscope objectives. Greatly restricts the improvement of its resolution

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  • Marker-free far-field super-resolution microscopy system and method based on super-resolution lens
  • Marker-free far-field super-resolution microscopy system and method based on super-resolution lens
  • Marker-free far-field super-resolution microscopy system and method based on super-resolution lens

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Embodiment Construction

[0041] The technical solution of the present invention will be further described below in conjunction with the accompanying drawings.

[0042] Such as figure 1 As shown, the present invention proposes a non-marking far-field super-resolution microscope system based on a super-resolution lens, which includes a light source module, a super-resolution flat-field scanning objective lens module, a super-resolution beam transmission illumination module, a sample two-dimensional scanning module, and a non-marking display module. Micro detection module, phase contrast module, high speed signal acquisition module, scanning control module, micro monitoring module and computer and software module. The system can work in reflection mode and transmission mode, and its specific structure is as follows:

[0043] In reflection working mode, it includes a light source module arranged along the optical path, a super-resolution flat-field scanning objective lens module, a two-dimensional sample...

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Abstract

The invention provides a non-marking far-field super-resolution microscope system and method based on a super-resolution lens. The system comprises a light source module, a super-resolution flat fieldscanning objective lens module, a sample two-dimensional scanning module, a non-marking microscopic detection module, a phase contrast module, a high speed signal acquisition module, a scan control module, a microscopic monitoring module and a computer and software module that in a reflection working mode and comprises the light source module, a super-resolution beam transmitting illumination module, the super-resolution flat field scanning objective lens module, the sample two-dimensional scanning module, the non-marking microscopic detection module, the phase contrast module, the high speedsignal acquisition module, the scan control module, the microscopic monitoring module and the computer and software module in a transmitting working mode. With the super-resolution flat field scanning objective lens module and the super-resolution illumination lens, the unmarked super-resolution resolution microscopic image of a three-dimensional sample is obtained rapidly in confocal mode; and the lateral resolution is lower than the diffraction limit.

Description

technical field [0001] The invention belongs to the field of visible light microscopy technology, in particular to far-field super-resolution microscopy technology, which is applied to the detection of biological samples, material samples and the like. Background technique [0002] The existing microscopy techniques can be roughly divided into two categories: near-field microscopy and far-field microscopy. Near-field microscopy includes microsphere-assisted imaging, near-field scanning microscopy and other methods. Near-field microscopy can achieve super-resolution microscopy imaging, but its working distance is smaller than the working wavelength, which greatly limits its practical application; far-field super-resolution technology, with a large working distance, can overcome the shortcomings of near-field microscopy . Existing far-field super-resolution microscopy techniques include stimulated emission depletion microscopy, local activation microscopy, random light recons...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B21/00G02B21/06
Inventor 陈刚温中泉梁高峰张智海
Owner CHONGQING UNIV
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