Two-axis orthogonal rotation system and method for CVD equipment

Abstract

The invention discloses biaxial orthogonal rotation system for CVD equipment. The biaxial orthogonal rotation system comprises a CVD deposition furnace body, graphite thermal insulation pipes, a heating body, rotating shafts, a sleeve, a component clamp and rotary power devices; the three rotary power devices are connected with the component clamp arranged in the CVD deposition furnace body through the three rotating shafts; the rotary power devices are used for providing power for the whole system, controlling the rotating speed and the telescopic positions of the rotating shafts, and furthercontrolling the component clamp to rotate around X axis or rotate around Y axis; and different rotation directions are adopted in different deposition stages, so that a position with insufficient deposition of a complex-shaped component can be compensated to a greater extent. By adopting different rotational speeds, velocity distribution of surrounding gas of the component relative to the component can be improved, so that the relative flowing velocity distribution is most beneficial to obtain uniform deposition.

Description

technical field [0001] The invention belongs to the field of chemical vapor deposition (CVD) equipment, and in particular relates to a dual-axis orthogonal rotation system and method for CVD equipment. Background technique [0002] The preparation of epitaxial layer materials represented by anti-oxidation and ablation ceramic coatings is inseparable from CVD (Chemical Vapor Deposition, chemical vapor deposition) equipment. CVD is to generate a non-volatile solid product at a certain temperature through the pyrolysis and reduction of a certain gas phase precursor and deposit it on the surface of the substrate to achieve the purpose of forming a coating. This method has the advantages of simple deposition equipment, low preparation temperature, high purity of the prepared coating, and controllable structure. Because the reactants interact in the gas phase in the deposition chamber, the CVD method has better wrap-around properties than other methods. At the same time, since C...

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Problems solved by technology

[0005] In order to avoid the deficiencies of the prior art, the present invention proposes a two-axis orthogonal rotation system for CVD equipment, by controlling the components to rotate in two dimensions in the CVD deposition furnace body, so that different parts of the components are in uniform contact with the gas , can break the bottleneck of existing CVD equipment, achieve uniform deposition conditions, and greatly improve the uniformity, compactness and interface bonding force of the epitaxial layer, thereby solving the problem of poor deposition quality and stability of the epitaxial layer of components, especially large-scale and complex components. Unable to effectively control and other technical problems to achieve uniform and controllable preparation of high-performance epitaxial layers

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