2results about How to "Uniform preparation" patented technology

The method for preparing an amorphous silicon thin film according to the present invention includes: placing a substrate in a vacuum chamber; controlling the pressure in the vacuum chamber at a predetermined value and performing surface treatment on the substrate; and introducing silane gas and a rarefied gas into the vacuum chamber, heating the substrate, and depositing an amorphous silicon thin film on the substrate using silane gas ions. This method is characterized by low manufacturing difficulty, simple process, and low cost, while improving the growth rate and uniformity of the thin film, making the manufacturing process more stable and controllable, and resulting in a more uniform, dense, and stable amorphous silicon thin film.

The utility model belongs to conductive material technical field discloses a kind of substrate surface conductive polyaniline coating continuous processing device, for processing conductive polyaniline coating to substrate surface, comprising: DBD plasma processor, including plasma power supply, plasma power supply output end is connected with discharge electrode, plasma power supply ground end is connected with ground electrode, ground electrode and discharge electrode are placed in parallel, and gap for substrate passing is left between ground electrode and discharge electrode, DBD plasma processor is used to carry out hydrophilization and roughening treatment to substrate surface;Liquid storage system, liquid storage system includes three liquid storage tanks, three liquid storage tanks are respectively filled with aniline monomer solution, doped acid solution and oxidizing agent solution;The problems existing in the prior art that the preparation process is complex, the coating uniformity and the conductivity are not good are solved, the processing efficiency and the quality of the conductive polyaniline coating are effectively improved, and the continuous production of environmental protection and controllable morphology is ensured.