Microsensor and its preparation method
A technology of micro-sensors and substrates, applied in the direction of micro-structure technology, micro-structure devices, manufacturing micro-structure devices, etc., can solve the problems of poor temperature uniformity in the heating area, affecting sensor performance, and long processing time, so as to achieve low cost and avoid Leakage, enhance the effect of heat dissipation
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Embodiment 1
[0060] see figure 1 , the present invention provides a preparation method of a micro sensor, the preparation method of the micro sensor comprises the following steps:
[0061] 1) providing a substrate, and forming a limiting groove on the upper surface of the substrate, and the limiting groove defines the position and shape of the subsequently formed heat dissipation structure layer;
[0062] 2) forming an insulating material layer on the upper surface of the substrate and in the limiting groove, and the insulating material layer filled in the limiting groove constitutes a limiting ring;
[0063]3) forming test electrodes, heating elements and pads on the upper surface of the insulating material layer;
[0064] 4) etching the insulating material layer to define the shape and position of the main support layer and the support beam;
[0065] 5) etching the substrate to form release trenches in the substrate;
[0066] 6) Etching the substrate based on the release trenches to f...
Embodiment 2
[0094] please continue Figure 7 and Figure 8 , the present invention also provides a microsensor, which includes: a substrate 10, a groove 102 is formed on the upper surface of the substrate 10; a heat uniform structure layer 18, and the heat uniform structure 18 is suspended Above the groove 102, and the heat spreading structure 18 has a distance from the bottom of the groove 102 and the sidewall of the groove 102; a support beam 16, the support beam 16 is located in the groove Above the groove 102, and the support beam 16 is located between the heat evenly dissipating structure layer 18 and the sidewall of the groove 102; one end of the support beam 16 is connected to the heat evenly distributing structure layer 18, The other end is connected to the substrate 10; the main body support layer 17, the main body support layer 17 is at least located on the upper surface of the heat spreading structure layer 18; the limit ring 111, the limit ring 111 is located on the main body...
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