Lithography apparatus and device manufacturing method

Abstract

An immersion lithography apparatus comprising: a support table (WT) configured to support an object (W) having at least one target portion (C); a projection system (PS) configured to project a patterned beam onto the object; a positioner (PW) configured to move the support table relative to the projection system; a liquid confinement structure (12) configured to confine a liquid to an immersion space (10) between the projection system and a surface of the object and / or the support table using a fluid flow into and / or out of the liquid confinement structure through a series of openings (60, 300) formed in the liquid confinement structure; and a controller configured to control the positioner to move the support table to follow a route comprised of a series of motions and to control the liquid confinement structure wherein each motion involves the support table moving relative to the liquid confinement structure such that a portion of the support table which moves from being not under the liquid confinement structure to being under the liquid confinement structure passes under a leading edge of the liquid confinement structure and a portion of the support table which moves from beingunder the liquid confinement structure to being not under the liquid confinement structure passes under a trailing edge of the liquid confinement structure, the controller adapted to: predict whetherthe liquid will be lost from the immersion space during at least one motion of the series of motions in which an edge of the immersion space passes over an edge of the object, and if liquid loss fromthe immersion space is predicted, to modify the fluid flow such that a first fluid flow rate into or out of an opening of the series of openings at the leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening of the series of openings at the trailing edge of the liquid confinement structure during the motion of predicted liquid loss or amotion of the series of motions subsequent to the motion of predicted liquid loss.

Description

[0001] Cross References to Related Applications [0002] This application claims priority from European Application No. 16203967.1 filed on December 14, 2016 and European Application No. 17163003.1 filed on March 27, 2017, which are hereby incorporated by reference in their entirety. technical field [0003] The present invention relates to a lithographic apparatus and a method of manufacturing devices using the lithographic apparatus. Background technique [0004] A lithographic apparatus is a machine that applies a desired pattern to a substrate, usually to a target portion of the substrate. For example, lithographic equipment may be used in the manufacture of integrated circuits (ICs). In this case, a patterning device, alternatively referred to as a mask or reticle, may be used to generate the circuit pattern to be formed on the individual layers of the IC. The pattern can be transferred onto a target portion (eg, comprising a portion, one or more dies) on a substrate ...

AI Technical Summary

Problems solved by technology

[0009] Tracking defects and exposure defects can cause problems for objects other than substrates, such as sensors

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