Thin film deposition and coating system and method for depositing and coating thin films
A coating system and thin film deposition technology, applied in gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of uneven film surface, poor stability, poor insulation performance, etc.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0043] Such as figure 1 As shown, the present embodiment provides a film 2 deposition and coating system for coating capacitor polymer film 2 materials. The film 2 deposition and coating system includes two groups of post-processing devices, two groups of coating devices, and two groups of pre-treatment devices. devices and delivery devices. The material of the polymer capacitive film 2 can be polyethylene, polypropylene, polyimide, polytetrafluoroethylene, ferroelectric polymer and the like.
[0044] In this embodiment, the post-processing device includes a high-voltage electrode plate 5 and a ground electrode plate 3 that are respectively adjacent to the two sides of the film 2 and oppositely arranged, that is, the high-voltage electrode plate 5 and the ground electrode plate 3 are respectively close to different surfaces of the film 2 and correspond to It is provided that the side of the high-voltage electrode plate 5 close to the thin film 2 is provided with a partial dis...
Embodiment 2
[0064] This embodiment provides a method for depositing and coating the thin film 2, which includes the following steps: performing surface aging treatment on the coated thin film 2 through corona plasma generated by pulsed corona discharge, so as to make the coated film surface smooth. The thin film 2 is coated by the precursor under the action of the plasma generated by the pulsed dielectric barrier discharge. Before coating the thin film 2, the plasma generated by the pulse dielectric barrier discharge improves the adhesive force on the surface of the thin film 2.
[0065] The method includes a pretreatment process, a deposition coating treatment process and a post-treatment process. Pretreatment uses DBD (dielectric barrier discharge) to preliminarily treat the film 2. By introducing polar groups, the adhesion of the film 2 substrate is improved, and the adhesion between the film 2 substrate and the coating is improved; the deposition coating treatment uses discharge plasm...
Embodiment 3
[0068] Two rolls of polypropylene capacitive film 2 (BOPP) with a width of 0.5×50 m and a thickness of 12 μm were selected as materials to be processed, one roll was output from the output roller 1, and the other roll was not processed as a comparison. The speed of the output roller 1 and the collection roller 10 is controlled to be 1 cm / s, and 30 sccm of titanium tetrachloride oxygen aerosol is introduced between each intake gap of the high-voltage electrode array 7 and the dielectric barrier array 8 in the coating deposition area of the film 2 . Between the high-voltage electrode plate 5 and the ground electrode plate 3 in the pretreatment area, between the high-voltage electrode array 7 and the ground electrode plate 3 in the thin film 2 coating deposition area, between the high-voltage electrode plate 5 with needles in the post-treatment area, and the ground electrode plate 3. Add 6kV, 500Hz pulse voltage. A uniform plasma appears in the pretreatment area, and the plasma...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More