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Optical micro-nano measurement device, method for extracting micro-nano size information of structures to be measured

A measuring device and optical technology, applied in the direction of measuring device, adopting optical device, nano-optics, etc., can solve the problem of reducing the accuracy of measurement results, and achieve the effects of fast measurement speed, easy installation and simple structure

Active Publication Date: 2020-09-22
BEIHANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The above factors will introduce mechanical and optical noise, resulting in a reduction in the accuracy of the measurement results

Method used

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  • Optical micro-nano measurement device, method for extracting micro-nano size information of structures to be measured
  • Optical micro-nano measurement device, method for extracting micro-nano size information of structures to be measured
  • Optical micro-nano measurement device, method for extracting micro-nano size information of structures to be measured

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Embodiment Construction

[0034] figure 1 It is a model schematic diagram of the measurement system 10 of the embodiment of the present invention, and the system is composed of the following three parts: reflective Kohler illumination part, imaging part and objective lens positioning part, wherein the reflective Kohler illumination part includes: LED light source 11, the first Objective lens 21 , pinhole 22 , first lens 23 , polarizing plate 24 , non-polarizing beam splitting prism 25 , second lens 26 , plane mirror 27 , second objective lens 28 , and stage 12 . The imaging part includes: a second objective lens 28 , a piezoelectric positioner 29 , a plane mirror 27 , a second lens 26 , a non-polarizing beam splitter prism 25 , a third lens 31 , a fourth lens 32 , and a CCD camera 33 . The objective lens positioning part includes a piezoelectric positioner 29 and its control unit 14 . The second objective lens 28 is controlled by a piezoelectric positioner 29 . When the measurement starts, the contro...

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Abstract

The invention provides an optical micro-nano measuring device and a method for extracting micro-nano size information of a structure to be measured. An illumination and imaging part of the measuring device is composed of 4f systems, a polarized reflective Kohler illumination mode of different illumination value apertures can be generated and an image of the needed amplification multiplying power can be obtained according to the type and sensitivity requirements for the target to be measured. A piezoelectric positioner of the device realizes through-focus scanning via scanning of an object lens of the positioner itself, the scanning stroke can be controlled accurately, the device can be directly installed in a production line, and the requirement of online measurement can be met. The size extraction method includes a Fourier transform based noise cancelling algorithm. The Fourier frequency spectrum and phase of each practical out-of-focus image and those of a corresponding ideal simulated out-of-focus image are calculated, the frequency spectrum of the practical image is combined with the phase of the ideal image, inverse Fourier transform is implemented, so that optical and mechanical noise generated due to outside interference in the measurement process can be eliminated.

Description

technical field [0001] The invention relates to a through-focus scanning optical micro-nano measurement device based on Fourier transform correction, a method for extracting micro-nano size information of a structure to be measured, and a recording medium. It specifically relates to an optical nanometer measurement device capable of correcting optical and mechanical noise and obtaining higher measurement accuracy results and a method for extracting micronano size information of structures to be measured, belonging to the field of optical micronano measurement and process control in the semiconductor industry. Background technique [0002] Driven by Moore's Law, the size of semiconductors continues to decrease, and its structure gradually develops from a 2-dimensional plane to a 3-dimensional three-dimensional direction. However, the traditional micro-nano measurement method has gradually exposed its limitations. For example, the measurement efficiency of atomic force microsc...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/00G06T5/00G06T5/10G06T7/60B82Y35/00B82Y20/00
CPCB82Y20/00B82Y35/00G01B11/00G01B21/045G06T5/002G06T5/006G06T5/10G06T7/60G06T2207/10056G06T2207/20056
Inventor 屈玉福彭仁举郝嘉麟柳姝姌
Owner BEIHANG UNIV