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Method for purifying hydrogen, argon and helium

A technology of argon and helium, which is applied in the field of argon and helium purification and hydrogen, can solve the problems that the depth of removal cannot meet the demand, investment and economic efficiency are not high, so as to reduce investment cost and operating cost, improve Purification effect, cooling area reduction effect

Inactive Publication Date: 2019-10-22
DALIAN ZHONGDING CHEM
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  • Abstract
  • Description
  • Claims
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Problems solved by technology

If the method of cryogenic distillation is used, the investment and economy are not high, and the impurity nitrogen is difficult to be chemically adsorbed at room temperature. During physical adsorption, the depth of removal cannot meet the demand (<100ppb~0.1ppb)

Method used

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  • Method for purifying hydrogen, argon and helium
  • Method for purifying hydrogen, argon and helium
  • Method for purifying hydrogen, argon and helium

Examples

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Embodiment 1

[0049] Such as Figure 1-16 As shown, a device for purifying hydrogen, argon and helium includes a raw material gas inlet 1, an external regeneration gas inlet 2, a cooling water return port 3, and a cooling water upper water port 4. The raw material gas inlet 1 is located at the external Above the regeneration gas inlet 2, the cooling water return port 3, and the cooling water upper water port 4, the raw gas inlet 1 is connected to the deoxygenation adsorber A5 and the deoxygenation adsorber B6 through a valve, and the outlets of the deoxygenation adsorber A5 and the deoxygenation adsorber B6 are respectively connected in parallel Lead out and connect the regeneration heater A7 and the regeneration heater B8, the external regeneration gas inlet 2 is connected to the regeneration heater A7 and the regeneration heater B8, and the outlets of the deoxygenation adsorber A5 or the deoxygenation adsorber B6 are respectively drawn out and connected in parallel Regenerative cooler A16...

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Abstract

The invention relates to a method for purifying hydrogen, argon and helium, and belongs to the technical field of gas purification processes. The method mainly comprises an adsorption step, a gas aspirating step and a regeneration step, and the adsorption step is as follows: a raw material gas is filtered, and enters an oxygen-removal absorber A through a raw material gas inlet in order to removean impurity gas comprising carbon monoxide, carbon dioxide, oxygen and water; and the gas aspirating step is as follows: the adsorbed raw material gas enters a gas aspirating heat exchanger, exchangesheat with a high-temperature gas from a gas aspirator, enters an aspirated gas heater, is heated to the purification temperature, then enters the gas aspirator, flows out the gas aspirator, then enters the gas aspirating heat exchanger again, and exchanges heat with the cold raw material gas. The raw material gas enters from the upper part, and goes through a purifying filler bed in a purifying device from top to bottom, and the product gas is produced in the lower part, so the purifying effect is improved.

Description

technical field [0001] The invention belongs to the technical field of gas purification technology, and in particular relates to a method for purifying hydrogen, argon and helium. Background technique [0002] The impurity methane in the gas is a kind of impurity that is difficult to remove, and it is extremely difficult to remove it by physical and chemical adsorption methods. If the method of cryogenic distillation is used, the investment and economy are not high, and the impurity nitrogen is difficult to be chemically adsorbed at room temperature. During physical adsorption, the depth of removal cannot meet the demand (<100ppb~0.1ppb). Contents of the invention [0003] In order to make up for the deficiencies of the prior art, the invention provides a method for purifying hydrogen, argon and helium. The method of combined adsorption and suction is used to remove trace impurities such as oxygen, water, carbon dioxide, carbon monoxide, hydrogen, methane and nitrogen ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01D53/04B01D46/00C01B23/00C01B3/50
CPCB01D53/04C01B23/0084C01B3/508B01D2257/502B01D2257/504B01D2257/104B01D2257/80B01D46/62Y02C20/40
Inventor 赵霖于洋邱浩明乐昀刘智超金万宇郑晨达郭奎宇王鹏邱长春
Owner DALIAN ZHONGDING CHEM
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