A non-invasive intracranial pressure monitoring method and device

A monitoring device and intracranial pressure technology, applied in intracranial pressure measurement, diagnostic recording/measurement, medical science, etc., can solve the problems of not being able to quickly reflect changes in intracranial pressure, and measurement accuracy easily affected by factors such as temperature and pulse , to achieve the effect of simple measurement, quick response and guaranteed accuracy

Active Publication Date: 2022-03-08
SICHUAN UNIV
View PDF8 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is to provide a non-invasive intracranial pressure monitoring method for the existing technology that the measurement accuracy is easily affected by factors such as temperature and pulse, and cannot quickly reflect changes in intracranial pressure. According to near-infrared spectroscopy technology, The intracranial pressure is calculated by using the pulse wave propagation time, and the influence of the local cerebral oxygen saturation and temperature is considered, and the local cerebral oxygen saturation and temperature data are used for correction to realize the monitoring of the intracranial pressure

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A non-invasive intracranial pressure monitoring method and device
  • A non-invasive intracranial pressure monitoring method and device
  • A non-invasive intracranial pressure monitoring method and device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0057] refer to figure 1 , a non-invasive non-invasive intracranial pressure monitoring method, comprising the following steps:

[0058] S1, collect the first head pulse wave data, temperature data and ECG data of the person under test,

[0059] According to the near-infrared spectroscopy technology, at a frequency of 40 Hz, two different wavelengths of near-infrared light are alternately emitted, the wavelengths are 760nm and 850nm respectively, and four groups of near-infrared lights refracted through the brain at different head positions are received to obtain the first A head pulse wave data p 1-760 ,p 1-850 ,p 2-760 ,p 2-850 ,p 3-760 ,p 3-850 , p 4-760 ,p 4-850 , where x in the subscript x-yyy corresponds to the near-infrared light receiving group No. 1-4, and yyy corresponds to the wavelength of the received near-infrared light, wherein the first head pulse wave data is the head pulse wave.

[0060] Collect the surface temperature of the scalp of the measured pe...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a non-invasive intracranial pressure monitoring method and device. The monitoring method: first collect head pulse wave data, temperature data and ECG data, then use the temperature data to correct the head pulse wave, and then use the corrected head pulse wave The head pulse wave data is used to calculate the local cerebral oxygen saturation, and then the corrected head pulse wave data and ECG data are used to calculate the pulse wave propagation time, and finally the intracranial pressure value. The present invention uses the pulse wave propagation time to calculate the intracranial pressure value, and introduces local cerebral oxygen saturation and temperature data for correction, which can reduce the influence of temperature and local cerebral oxygen saturation on the monitoring accuracy of intracranial pressure, and quickly reflect the intracranial pressure. changes in internal pressure.

Description

technical field [0001] The invention relates to the technical field of intracranial pressure monitoring, in particular to a non-invasive intracranial pressure monitoring method and device. Background technique [0002] Increased intracranial pressure (ICP) is the most critical clinical sign in neurosurgery. It is not only the result of the progression of many intracranial lesions, but also the most common cause of disease progression and poor prognosis. Monitoring the value of intracranial pressure ICP provides an effective basis for diagnosing cerebral hypoperfusion caused by increased ICP, blocking brain tissue compression, displacement, and even brain herniation. [0003] At present, invasive ICP monitoring (ventricle puncture, intracranial pressure probe insertion) is used as the gold standard in clinical practice, but its disadvantages are obvious: 1. Invasive operation needs to be completed in the operating room; 2. It needs to be removed within seven days of monitorin...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): A61B5/03
CPCA61B5/031
Inventor 潘帆冯军峰郑定昌何培宇
Owner SICHUAN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap