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Ion source grid assembly

An ion source and grid technology, applied in the field of optics, can solve the problems of different adjustment accuracy and repeatability, the increase of ion beam spatial distribution error, and the inability to remove function adjustment and optimization, etc., so as to achieve easy maintenance and The effect of replacement, simplification of installation steps, and improvement of work stability

Active Publication Date: 2021-06-15
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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Problems solved by technology

The installation of the three-grid ion grid mainly depends on the experience of the operator. The installation and adjustment efficiency is low, and the accuracy and repeatability of the installation and adjustment vary from person to person. Processing efficiency and processing accuracy
[0006] In addition, once the current three-grid ion grid is assembled, its working distance and performance have been determined, and it is impossible to adjust and optimize the removal function online according to the characteristics of the surface shape error, that is, it is impossible to realize the "zoom". "function, if you need to change the size of the removal function, the amount of material removal, etc., you must replace the grid

Method used

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Embodiment Construction

[0031] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with specific embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, but not to limit the present invention.

[0032] An embodiment of the present invention provides an ion source grid device, which includes at least two grids and an insulating frame fixed on the outside of each grid, and the outer side of each insulating frame is pierced with a grid connected to the inner grid. Electrode bolts, the electrode bolts supply power to the grid, two adjacent insulating frames are connected by threads, and the relative distance between two adjacent grids is changed by rotating the insulating frames using threads.

[0033] The purpose of the screw connection of the insulating frame is to facilitate the disassembly and assembly of ...

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Abstract

The invention provides an ion source grid device, which includes at least two grids and an insulating frame fixed on the outside of each grid, and electrode bolts connected to the inner grid are pierced on the outside of each insulating frame , two adjacent insulating frames are connected by threads, and the relative distance between two adjacent grids is changed by rotating the insulating frames using threads. The ion source grid device provided by the present invention can simplify the installation steps of the ion grid, increase the integration of the ion grid system, ensure the installation and positioning accuracy of the ion grid while realizing rapid replacement, and utilize the rotating adjustment grid of the insulating frame The relative distance between the grids realizes the "zoom" function of the ion grid system, which is convenient for maintenance and replacement, saves time and improves work efficiency.

Description

technical field [0001] The invention relates to the field of optics, in particular to an ion source grid device. Background technique [0002] Ion beam processing is one of the important processes in contemporary micro-nano precision processing. It is a plasma generated by the glow discharge of organic gases and their mixtures. After extraction, beaming, acceleration, and neutralization, a high-energy and high-speed neutral ion beam is formed. Micro-nano-level ultra-fine processing such as polishing, cleaning, etching, sputtering, deposition, coating, implantation, etc. [0003] In order to obtain the desired ion beam, it is necessary to pull the ion beam out of the discharge chamber, and the ion grid system is the main device for pulling the ion beam out of the discharge chamber. The grid is a device used for beam extraction and modification in the ion source. It uses graphite or molybdenum to make a mesh electrode and is located at the front end of the ion source outlet....

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01J37/08H01J37/04
CPCH01J37/04H01J37/08
Inventor 唐瓦邓伟杰薛栋林尹小林
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI