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Method and equipment for improving exposure performance

A beam and slit technology, applied in microlithography exposure equipment, optomechanical equipment, exposure equipment for photo-plate making process, etc., can solve the problem of high cost

Inactive Publication Date: 2020-05-08
TAIWAN SEMICON MFG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] In advanced semiconductor technology, continued reductions in device size and increasingly complex circuit arrangements have made the design and manufacture of integrated circuits (ICs) more challenging and costly

Method used

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  • Method and equipment for improving exposure performance
  • Method and equipment for improving exposure performance
  • Method and equipment for improving exposure performance

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Embodiment Construction

[0012] The following disclosure provides many different embodiments or examples of different means for implementing the presented subject matter. Specific examples of components and arrangements are described below to simplify the present disclosure. Of course, these are examples only and are not intended to be limiting. For example, forming a first member over or on a second member in the following description may include an embodiment in which the first member and the second member are formed in direct contact, and may also include an embodiment in which the first member and the second member may be formed in direct contact. An embodiment in which an additional component is formed between the two components so that the first component and the second component may not be in direct contact. In addition, the present invention may repeat element symbols and / or letters in various examples. This repetition is for simplicity and clarity and does not in itself indicate a relations...

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Abstract

An embodiment of the present invention relate to method and equipment for improving exposure performance. A method and equipment of operating an illuminator are proposed. The method includes directinga radiation beam to the illuminator comprising slit fingers; sensing a temperature value of each of the slit fingers; determining a shifting value of the respective slit finger based on the temperature value; causing the respective slit finger to move according to the shifting value to form a light slit from the radiation beam; and exposing a workpiece using the light slit.

Description

technical field [0001] Embodiments of the present invention relate to methods and devices for improving exposure performance. Background technique [0002] In advanced semiconductor technology, continued reductions in device size and increasingly complex circuit arrangements have made the design and manufacture of integrated circuits (ICs) more challenging and costly. Therefore, there is a constant need to modify the structures and methods of designing and manufacturing semiconductor devices in order to improve device robustness and reduce manufacturing costs and processing time. Contents of the invention [0003] An embodiment of the present invention is directed to a method of operating a luminaire comprising: directing a beam of radiation to said luminaire comprising slit fingers; sensing the temperature of each of said slit fingers a temperature value; determining an offset value for the corresponding slit finger based on the temperature value; moving the correspondin...

Claims

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Application Information

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IPC IPC(8): G03F7/20G01K3/04G01K1/02G01K13/00
CPCG03F7/70008G03F7/70141G03F7/7015G01K3/04G01K1/024G03F7/70066G03F7/70858G03F7/7085G03F7/70891
Inventor 陆朝霈李永尧
Owner TAIWAN SEMICON MFG CO LTD