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Cleaning rotary brush

A technology of rotating brushes and rotating shafts, which is applied in the direction of cleaning methods and utensils, brushes, applications, etc., and can solve problems such as scratches on the surface of the object to be cleaned

Inactive Publication Date: 2003-10-01
AION
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0010] In addition, when the retained particles are hard substances such as abrasives, when the retained particles are pressed tightly on the surface of the object to be cleaned, there is a risk that the surface of the object to be cleaned will be scratched by the particles.
Utilize above-mentioned conventional rotating brush, owing to the PVAt system porous elastomer that contacts with the surface of the object to be cleaned has softness, thus can eliminate this inconvenience to a certain extent, but it is difficult to say that it can satisfy the requirements of precision cleaning in recent years. From this point of view, it is also hoped that the retained particles, etc. will be quickly discharged from the system

Method used

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  • Cleaning rotary brush
  • Cleaning rotary brush
  • Cleaning rotary brush

Examples

Experimental program
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Embodiment Construction

[0030] The following is based on figure 1 and figure 2 The first embodiment of the present invention will be described.

[0031] figure 1 is a plan view of the rotating brush for cleaning according to the first embodiment, figure 2 yes figure 1 The II-II line profile.

[0032] Such as figure 1 and figure 2 As shown, the cleaning rotary brush 1 includes a metal or resin hard base 3 formed in a substantially disc shape and a brush main body 5 mounted on the base 3 .

[0033] A circular hole 7 is formed near the center of the base 3 . The base 3 is tightly connected and fixed on the end surface 9 a of the rotating shaft 9 by the bolts 11 passing through the round hole 7 , and rotates together with the rotating shaft 9 . The bolt 11 and the rotating shaft 9 are in contact with the peripheral portions 13, 15 of the circular hole 7 in the surface 3a and the rear surface 3b of the hollow circular base 3, respectively. The area other than the peripheral portion 13, 15 of t...

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PUM

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Abstract

The cleaning rotating brush (1) is equipped with a hard substrate (3) installed on the rotating shaft and a plurality of striped protrusions (27) protruding from the working surface of the substrate (3). The striped protrusions (27) The top rotates substantially in the same plane and contacts the part to be cleaned. The stripe-shaped protrusions (27) are made of polyvinyl acetate-based porous elastomer, and are continuously arranged on the side extending from the inner reference point (31a) on the rotation center (35) side of the working surface to the outer edge (17b) side of the working surface. On a plurality of imaginary setting lines (31) of the outer reference point (31b). The length L1 of the stripe-shaped protrusion (27) in the longitudinal direction is greater than the length D1 of the stripe-shaped protrusion (27) in the width direction. Thus, the used cleaning waste liquid containing the dirt and particles wiped off from the cleaning part is guided into the stripe-shaped protrusion (27), and is well guided to the outer reference point (31b), and the cleaning waste is quickly removed. Fluid drains out of the system.

Description

technical field [0001] The present invention relates to a rotating brush suitable for precision cleaning in the manufacturing process of electronic components such as silicon wafers, photolithography masks, disk substrates, glass substrates for liquid crystals, etc., which require extremely high surface precision and cleanliness. More specifically , relates to a rotating brush suitable for brush cleaning. Background technique [0002] In recent years, in the electronic industry, the precision of various components has been rapidly improved, represented by the integration degree of silicon wafers and the recording density of magnetic disks. The improvement. In particular, chemical contamination and adhered particles on the surface of parts have a great influence on the yield rate and operation reliability of products, so precision cleaning is very important in the manufacturing process. [0003] As a conventional cleaning method, a wet scrubbing method is known. The brushi...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): A46B7/08A46B13/00B08B1/04H01L21/00
CPCA46B13/008B08B1/007B08B1/04H01L21/67046
Inventor 合田周起井出正男德永好
Owner AION