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Moisturizing mask and preparation method thereof

A technology of wet face and mixed liquid, which is applied in the field of daily chemicals, and can solve problems such as poor consumer experience, slow absorption, and affecting product stability.

Pending Publication Date: 2021-05-18
FUJIAN PIENTZEHUANG COSMETICS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] There are many moisturizing masks on the market, but some of them absorb slowly after use, and the skin feels sticky, which is not good for consumers. The problem of sticky skin after use can be improved by adding silicone elastomers, but silicone elastomers Uneven dispersion in the system, especially for products with low viscosity such as facial masks, will affect the stability of the product

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] A moisturizing facial mask, its raw materials include by weight: 0.001% low molecular weight sodium hyaluronate, 1% trehalose, 0.051% plant extract, 0.01% tremella fruiting body extract, 0.2% yeast / rice fermentation product filtrate , 0.5% Panthenol, 0.1 Allantoin, 0.05% Dipotassium Glycyrrhizinate, 2.8% Oil, 1.45% Emulsifier, 0.25% Thickener, 3% Butylene Glycol, 3% 1,3 Propylene Glycol, 3% Polyethylene Diol-8, 3% Macrogol-32, 1% Ruba Tar, 2% 1,2-Pentanediol, 0.088% Potassium Hydroxide, 0.2% p-Hydroxyacetophenone, 0.005% Fragrance, 0.1% Disodium EDTA, 0.1% methylparaben, and the balance is water. Low molecular weight sodium hyaluronate has a molecular weight of 200,000-400,000.

[0027] The plant extract is a combination of six extracts including Panax notoginseng saponins, Dendrobium extract, Polygonatum odoratum extract, Scrophulariaceae extract, Poria cocos extract and Ophiopogon japonicus extract.

[0028] The thickener is 0.22% carbomer and 0.03% xanthan gum; the...

Embodiment 2

[0041] A moisturizing mask, its raw materials include by weight: 0.001% low molecular weight sodium hyaluronate, 0.5% trehalose, 1.1% plant extract, 0.02% white fungus fruiting body extract, 0.5% yeast / rice fermentation product filtrate , 1% panthenol, 0.1% allantoin, 0.05% dipotassium glycyrrhizinate, 2.8% oil, 1.45% emulsifier, 0.25% thickener, 3% butanediol, 3% 1,3 propylene glycol, 3% poly Ethylene glycol-8, 3% polyethylene glycol-32, 1% Luba tar, 2% 1,2-pentanediol, 0.088% potassium hydroxide, 0.2% p-hydroxyacetophenone, 0.005% fragrance, 0.1 % EDTA disodium, 0.1% methyl paraben, and the balance is water.

[0042] The plant extracts are 0.1% Panax notoginseng saponins, 0.2% Dendrobium extract, 0.2% Polygonatum odoratum extract, 0.2% Scrophulariaceae extract, 0.2% Poria cocos extract, 0.2% Ophiopogon japonicus extract combination.

[0043] The thickener is 0.22% carbomer and 0.03% xanthan gum; the oil is divided into 0.5% polydimethylsiloxane, 0.5% cyclopentasiloxane, 1....

Embodiment 3

[0056] A moisturizing facial mask, its raw materials include by weight: 0.01% low molecular weight sodium hyaluronate, 0.5% trehalose, 0.51% plant extract, 0.01% white fungus fruiting body extract, 0.1% yeast / rice fermentation product filtrate , 0.5% panthenol, 0.1% allantoin, 0.01% dipotassium glycyrrhizinate, 2.8% oil, 1.45% emulsifier, 0.25% thickener, 3% butylene glycol, 3% 1,3 propylene glycol, 3% poly Ethylene glycol-8, 3% polyethylene glycol-32, 1% Luba tar, 2% 1,2-pentanediol, 0.088% potassium hydroxide, 0.2% p-hydroxyacetophenone, 0.005% fragrance, 0.1 % EDTA disodium, 0.1% methyl paraben, and the balance is water.

[0057] The plant extracts are 0.01% Panax notoginseng saponins, 0.1% Dendrobium extract, 0.1% Polygonatum odoratum extract, 0.1% Scrophulariaceae extract, 0.1% Poria cocos extract, 0.1% Ophiopogon japonicus extract combination.

[0058] The thickener is 0.22% carbomer and 0.03% xanthan gum; the oil is divided into 0.5% polydimethylsiloxane, 0.5% cyclope...

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PUM

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Abstract

The invention discloses a moisturizing mask and a preparation method thereof, and belongs to the field of daily chemicals. The moisturizing mask is prepared from the following components: 0.001 to 0.01 percent of low molecular sodium hyaluronate, 0.5 to 1.5 percent of trehalose, 0.01 to 0.6 percent of plant extract, 0.005 to 0.1 percent of tremella fuciformis sporocarp extract, 0.1 to 1 percent of yeast / rice fermentation product filtrate, 0.2 to 1 percent of panthenol, 0.05 to 0.5 percent of allantoin, 0.01 to 0.1 percent of dipotassium glycyrrhizinate, 2 to 3.5 percent of oil, 1 to 2 percent of emulsifier, 0.2 to 0.3 percent of thickener, 2 to 5 percent of butanediol, 2 to 5 percent of 1, 3-propylene glycol, 1 to 5 percent of polyethylene glycol-8, 1 to 3 percent of polyethylene glycol-32, 1 to 2 percent of Luba tar, 1 to 3 percent of 1, 2-pentanediol, 0.08 to 0.09 percent of potassium hydroxide, 0.1 to 0.5 percent of p-hydroxyacetophenone, 0.005 to 0.01 percent of essence and the balance water. The mask disclosed by the invention has a very good moisturizing effect, and the influence of an organic silicon elastomer on the product stability is avoided.

Description

technical field [0001] The invention belongs to the field of daily chemicals, and in particular relates to a moisturizing facial mask and a preparation method thereof. Background technique [0002] Skin is the largest organ of the human body and can be divided into epidermis, dermis and subcutaneous tissue according to its structure. The epidermis and dermis are skin structures related to moisturizing, in which the keratinocytes, intercellular lipids, natural moisturizing factors in the epidermis, and aquaporins in the basal layer are closely related to the moisturizing function of the skin. [0003] The water content of normal skin is 20%-35%. When the water content of the skin drops below 10%, when the stratum corneum lacks water, the skin will be dry, and the skin will become dull, with scaling, dullness, A series of skin problems such as redness, itching, and damaged skin barrier. Moisturizing is the basis of skin care, and it is also one of the biggest effects of cosm...

Claims

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Application Information

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IPC IPC(8): A61K8/9794A61K8/9789A61K8/9728A61K8/60A61K8/73A61K8/42A61K8/49A61K8/63A61K8/891A61K8/58A61K8/67A61Q19/00A61K36/8984A61P17/00
CPCA61K8/9794A61K8/9789A61K8/9728A61K8/60A61K8/735A61K8/42A61K8/4946A61K8/63A61K8/891A61K8/585A61K8/678A61Q19/00A61K36/258A61K36/8984A61K36/8969A61K36/808A61K36/076A61K36/8968A61P17/00A61K2800/85A61K2800/5922
Inventor 王旭楠郑燕玲赵玥郑慧蓉
Owner FUJIAN PIENTZEHUANG COSMETICS CO LTD