Device for manufacturing target material

A target and bottom plate technology, applied in workpiece clamping devices, manufacturing tools, etc., can solve problems such as complex structure, weak target clamping, and reduced target quality

Inactive Publication Date: 2021-05-18
株洲市智汇知识产权运营服务有限责任公司
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the existing target fixtures for machining are complex in structure, and the target is not firmly clamped, and the position of the target is prone to deviation, which reduces the quality of the produced target. Therefore, a device for making the target is proposed

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Device for manufacturing target material
  • Device for manufacturing target material

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0016] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0017] Please refer to Figure 1-2 , the present invention provides a technical solution: a device for making a target, including a base plate 1, a chamber 2 is opened in the base plate 1, and two first fixing blocks 3 are fixedly installed on the inner wall of the top of the chamber 2. The top of a fixed block 3 is provided with a rotating groove 4, and a threaded rod 5 is installed in the rotating groove 4, and the tops of the two threaded rods 5 extend to t...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention belongs to the technical field of target material manufacturing, and particularly relates to a device for manufacturing a target material. The device comprises a bottom plate, a cavity is formed in the bottom plate, two first fixing blocks are fixedly installed on the inner wall of the top of the cavity, rotating grooves are formed in the tops of the first fixing blocks, threaded rods are rotationally installed in the rotating grooves, the top ends of the two threaded rods extend out of the corresponding rotating grooves correspondingly, the two threaded rods are fixedly sleeved with first belt wheels correspondingly, a motor is arranged at the bottom of the bottom plate, an output shaft of the motor penetrates through the bottom plate and extends into the cavity, a second belt wheel is fixedly installed on the output shaft of the motor, and a same belt is rotationally mounted on the second belt pulley and the two first belt pulleys. The device is simple in structure and convenient to use, the target material can be rapidly and firmly fixed, the position of the target material cannot deviate, the quality of manufactured products is improved, and the use requirements of people are met.

Description

technical field [0001] The invention relates to the technical field of target production, in particular to a device for producing a target. Background technique [0002] The target material is the target material bombarded by high-speed energetic particles. During the sputtering process, the target material needs to have sufficient mechanical strength to withstand the bombardment of ions, and the target material generates a lot of heat during the bombardment process, which requires welding and cooling systems. For complex structures In addition to high mechanical strength, high-quality targets also have high requirements for processing accuracy. In order to improve the mechanical strength and processing accuracy of the target, the target needs to use a fixture to fix the target during the manufacturing process. However, the existing target fixtures for mechanical processing are complex in structure, and the target is not firmly clamped, and the position of the target is pro...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): B25B11/00
CPCB25B11/00
Inventor 王懿
Owner 株洲市智汇知识产权运营服务有限责任公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap