A semiconductor material crushing device and method using low temperature intervention
A pulverizing device and semiconductor technology, used in grain processing and other directions, can solve the problems of difficult pulverization process, high hardness of semiconductor materials, and large pulverizing space, saving labor, improving pulverizing efficiency, and reducing agglomerated particles.
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[0042] The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention. see Figure 1-4 , an embodiment of the present invention provides a technical solution: a semiconductor material pulverization device using low temperature intervention, comprising a first chassis 1 and a second chassis 2 arranged side by side from left to right, and a right bottom chassis 2 on top of the second chassis 2 A primary crushing mechanism 3 is provided on the side, a low temperature intervention mechanism 4 is provided at t...
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