Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Patch antenna with high cross polarization ratio and communication base station

A patch antenna and substrate technology, applied in the directions of antennas, antenna parts, antenna supports/installation devices, etc., can solve the problems of low cross-polarization of patch antennas, affecting the quality of uplink communication of network coverage effect, etc.

Pending Publication Date: 2021-05-28
苏州硕贝德创新技术研究有限公司
View PDF0 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the patch antenna has the problem of relatively low cross-polarization ratio, and the cross-polarization ratio is an important index to measure the antenna radiation performance and coverage effect. Specifically, it refers to the ratio of the main polarization component of the antenna to the cross-polarization component, which reflects the is the polarization purity of the base station antenna, therefore, a low cross-polarization ratio will affect network coverage and uplink communication quality

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Patch antenna with high cross polarization ratio and communication base station
  • Patch antenna with high cross polarization ratio and communication base station
  • Patch antenna with high cross polarization ratio and communication base station

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0028] In order to make the above objects, features and advantages of the present application more obvious and comprehensible, the present application will be further described in detail below in conjunction with the accompanying drawings and specific implementation methods.

[0029] It can be seen from the description of the background technology that the cross-polarization ratio specifically refers to the ratio of the main polarization component of the antenna to the cross-polarization component, which is used to reflect the polarization purity of the antenna; the larger the cross-polarization ratio, the better the signal that can be obtained from the antenna. The stronger the orthogonality, the smaller the correlation between the two signals, resulting in good network coverage and excellent uplink communication quality. Therefore, finding a method that can improve the cross-polarization ratio of the patch antenna is of great significance in the technical field of 5G base sta...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a patch antenna with a high cross polarization ratio and a communication base station. The patch antenna comprises a substrate, a metal reflecting surface, a main radiating surface and a parasitic radiating surface, wherein the main radiating surface is arranged on the upper surface of the substrate, and is provided with a main radiating sheet and a feed port, a convex structure is arranged at one end of the main radiating surface, the convex structure is an inverted T shape, the convex direction of the convex structure is the direction of the feed port and is parallel to the feed port, the two sides of the convex structure are connected with the feed port, the metal reflecting surface is positioned on the lower surface of the substrate and is integrally formed through a laser etching or selective electroplating technology, the parasitic radiating surface comprises a parasitic radiation sheet arranged right above the main radiation sheet in parallel, and the parasitic radiation sheet is fixed on the substrate through a support column. By adopting the structure, the convex structure is arranged on the main radiation sheet to improve the polarization purity of the main radiating surface, so that the cross polarization ratio of the patch antenna is further improved; and the structure adopts two-point feed, so that the patch antenna is simple in wiring.

Description

technical field [0001] The present application relates to the technical field of mobile communication base stations, in particular to a patch antenna with a high cross-polarization ratio and a communication base station. Background technique [0002] Traditional communication base station antennas mostly use ±45-degree cross-arranged dipole antennas as oscillators, which have the advantages of broadband, high isolation, and high cross-polarization ratio. However, in order to ensure good reflection characteristics of the dipole antenna, it is generally required to maintain a distance of about a quarter of a wavelength between the front of the dipole antenna and the ground. Reducing the height of the antenna array is a major trend in the era of 5G communication base station technology. Therefore, in the strict requirements of the 5G communication base station on the height of the antenna array, the dipole type of the dipole antenna does not have an advantage in reducing the h...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): H01Q1/36H01Q1/38H01Q1/24
CPCH01Q1/246H01Q1/36H01Q1/38
Inventor 王扬
Owner 苏州硕贝德创新技术研究有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products