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Flow rate control device

A flow control device and flow technology, which is applied in the direction of flow control, measuring device, flow control of electric device, etc., can solve the problems of large flow measurement error and precision error, and achieve the effect of strong resistance to error

Pending Publication Date: 2021-11-09
FUJIKIN INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0014] Recently, in such a flow control device, it is required to perform flow control under the condition that the downstream pressure P2 is higher than before. Zero point deviation, etc., the flow measurement error becomes larger

Method used

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Embodiment Construction

[0069] Hereinafter, embodiments of the present invention will be described with reference to the drawings, but the present invention is not limited to the following embodiments.

[0070] figure 1 A gas supply system 1 incorporating a pressure-type flow control device 10 according to an embodiment of the present invention is shown. The gas supply system 1 includes: a gas supply source 2; a flow control device 10, which is arranged in a flow path 4 forming a gas supply line; the downstream side; the processing chamber 6 connected to the downstream side of the on-off valve 5 ; and the vacuum pump 7 connected to the processing chamber 6 .

[0071] The flow control device 10 is provided to control the flow rate of the gas flowing in the flow path 4 . The vacuum pump 7 is capable of evacuating the processing chamber 6 and the flow path 4 , and supplies the flow-controlled gas to the processing chamber 6 while the downstream side of the flow control device 10 is depressurized. Var...

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PUM

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Abstract

A flow rate control device 10 is provided with: a control valve 11; a throttle part 12 which is disposed on the downstream side of the control valve 11; an upstream pressure sensor 13 for measuring pressure P1 between the control valve 11 and the throttle part 12; a differential pressure sensor 20 for measuring differential pressure [delta]P between the upstream side and the downstream side of the throttle part 12; and an arithmetic control circuit 16 which is connected to the control valve 11, the upstream sensor 13, and the differential pressure sensor 20.

Description

technical field [0001] The present invention relates to a flow control device, and more particularly to a flow control device installed in a gas supply line of semiconductor manufacturing equipment or chemical manufacturing equipment. Background technique [0002] In semiconductor manufacturing equipment and chemical plants, various types of flowmeters and flow control devices are used to control the flow rates of material gases, etching gases, and the like. Among them, the pressure flow control device is widely used because it can control the mass flow rate of various fluids with high precision through a relatively simple mechanism that combines a control valve and a throttle (eg, an orifice plate, a critical nozzle). Unlike the thermal flow control device, the pressure type flow control device has excellent flow control characteristics capable of performing stable flow control even if the primary side supply pressure fluctuates greatly. [0003] Among the pressure type fl...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G05D7/06
CPCG01L13/06G01L15/00G05D7/0635G01F15/005G01F1/363G01L19/08Y10T137/7761
Inventor 平田薰井手口圭佑小川慎也杉田胜幸永濑正明西野功二池田信一伊藤祐之
Owner FUJIKIN INC
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