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Large hollow porous quartz glass preform and manufacturing the same

A technology of quartz glass and manufacturing method, which is applied in the direction of glass manufacturing equipment, glass fiber products, manufacturing tools, etc., to achieve the effect of uniform chlorine concentration or OH group concentration

Pending Publication Date: 2022-01-18
SHIN ETABU QUARTZ PRODS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Furthermore, Patent Document 4 is also a method of depositing glass particles on the surface of the starting rod to produce a solid glass particle deposit, but not a method of producing a hollow porous quartz glass base material.

Method used

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  • Large hollow porous quartz glass preform and manufacturing the same
  • Large hollow porous quartz glass preform and manufacturing the same
  • Large hollow porous quartz glass preform and manufacturing the same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0110] A plurality of burners for glass particle synthesis are arranged at fixed intervals, and the array of burners is reciprocated (swinged) relative to a rotating target [a ceramic tube with an outer diameter (OD) of 50mm], and glass particles are deposited in layers on the target. Manufacture of glass particle deposits, in the so-called OVD method, under the conditions of burner interval of 100mm, swing distance L of 100mm, swing speed S of 140mm / min (fixed), surface peripheral speed of 11m / min (fixed) A soot body from which a target is pulled out to obtain a hollow porous quartz glass base material. Table 3 shows the production conditions, Table 4 shows the results of the obtained hollow porous silica glass base material, and Tables 5 and 6 show the measurement results of the synthetic silica glass cylinders.

[0111] [table 3]

[0112] manufacturing conditions

[0113]

[0114] When growing the soot body from the target OD of 50 mm to an outer diameter (OD) of 400 m...

Embodiment 2

[0134] A hollow porous silica glass base material was obtained in the same manner as in Example 1 except that the production conditions were changed as shown in Table 3. That is, a soot body was produced under the conditions that the burner interval was 100 mm, the swing distance L was 100 mm, the swing speed S was 200 mm / min (fixed), and the surface peripheral speed was 9 m / min (fixed), and the soot body was pulled out. target to obtain a hollow porous quartz glass base material. Table 4 shows the results of the obtained hollow porous silica glass base materials, and Tables 5 and 6 show the measurement results of the synthetic silica glass cylinders.

[0135] When growing from the target OD50mm to the soot body OD400mm, the rotational speed was reduced from 57.3 rpm to 7.2 rpm under the above conditions. The lowest speed N at this time m 7.2rpm, γ=0.28.

[0136] As a result, it was possible to grow without vibration during the growth of the device, and without cracks towar...

Embodiment 3

[0145] A hollow porous silica glass base material was obtained in the same manner as in Example 1 except that the production conditions were changed as shown in Table 3. That is, a soot body was produced under the conditions of a burner interval of 100 mm, a swing distance L of 100 mm, a swing speed S of 600 mm / min (fixed), and a surface peripheral speed of 9 m / min (fixed), and the soot body was pulled out from the soot body. target to obtain a hollow porous quartz glass base material. Table 4 shows the results of the obtained hollow porous silica glass preforms, and Table 5 shows the measurement results of the synthetic silica glass cylinders.

[0146] In the case of growing from the target OD50mm to the soot body OD400mm, the rotational speed was reduced from 57.3 rpm to 7.2 rpm under the above conditions. The lowest speed N at this time m 7.2rpm, γ=0.84.

[0147] As a result, it was possible to grow without vibration during the growth of the device, and without cracks to...

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Abstract

Provided are such a method of manufacturing a hollow synthetic quartz glass porous preform and method of manufacturing a synthetic quartz glass cylinder as described below: even a soot body having an outer diameter of more than 300 mm can be produced without significantly increasing a load on an apparatus, such as a centrifugal force generated during growth; even when manufactured at low-speed rotation, the soot body is free of any crack or rupture; and a target can be easily extracted. Specifically, provided is a method of manufacturing a hollow porous quartz glass preform by an OVD method, wherein the rotation peripheral speed of the soot body is controlled so as to be practically constant by fluctuating the rotation number of the soot body on the basis of a fluctuating outer diameter of the soot body during growth, and wherein a frequency factor gamma calculated by the following equation is set so as to fall within the range of 0.13<=gamma<1.0 in a range in which the outer diameter of the soot body is more than 250 mm: gamma=S / (L*Nm), wherein S represents the moving speed (mm / min) of the burners, L represents the moving distance (mm) of the burners, and Nm represents the lowest value (rpm) of the rotation number of the soot body, which is fluctuated.

Description

technical field [0001] The present invention relates to a large hollow porous quartz glass base material and its manufacturing method, a hollow synthetic quartz glass cylinder using the same, and its manufacturing method, and particularly relates to a large hollow porous quartz glass base material having an outer diameter exceeding 300mm and a heavy weight. A method for producing a glass base material and a hollow porous silica glass base material capable of suitably producing the large hollow porous silica glass base material, a hollow synthetic quartz glass cylinder using the same, and a method for producing the same. Background technique [0002] Synthetic quartz glass is widely used in the optics, semiconductor, and chemical industries, especially as lens materials for projection and exposure systems in microlithography, as semiconductor manufacturing jigs, and as materials for optical fibers. [0003] The manufacture of the hollow synthetic quartz glass cylinder general...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03B8/04C03B19/14C03B20/00C03B37/014
CPCC03B19/1423C03B19/1453C03B20/00C03B37/0142C03B37/01446C03B2207/66C03B37/01406C03B37/01493C03B2201/04C03B2207/70C03B37/01413C03B2201/20C03B2207/52C03B19/14C03B19/1484C03B19/066C03B23/04C03B2203/16
Inventor 角儿太郎桑原光
Owner SHIN ETABU QUARTZ PRODS
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