A sensor layout method and system for a magnetic brain measurement helmet

A layout method and sensor technology, applied in the direction of sensors, diagnostic recording/measurement, instruments, etc., can solve the problems of not considering the cortical surface of the brain and the unreasonable distribution of sensors, and achieve the effect of reasonable distribution.

Active Publication Date: 2022-04-19
HANGZHOU INNOVATION RES INST OF BEIJING UNIV OF AERONAUTICS & ASTRONAUTICS
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Problems solved by technology

[0005] In view of the above-mentioned shortcomings and deficiencies of the prior art, the present invention provides a sensor layout method and system for a magnetoencephalographic measurement helmet, which solves the sensor distribution position existing in the prior art without considering the cortical surface of the brain. unreasonable technical issues

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  • A sensor layout method and system for a magnetic brain measurement helmet
  • A sensor layout method and system for a magnetic brain measurement helmet
  • A sensor layout method and system for a magnetic brain measurement helmet

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[0068] In order to better explain the present invention and facilitate understanding, the present invention will be described in detail below through specific embodiments in conjunction with the accompanying drawings.

[0069] In order to better understand the above technical solutions, the following will describe exemplary embodiments of the present invention in more detail with reference to the accompanying drawings. Although exemplary embodiments of the present invention are shown in the drawings, it should be understood that the invention may be embodied in various forms and should not be limited to the embodiments set forth herein. Rather, these embodiments are provided so that the present invention can be more clearly and thoroughly understood, and the scope of the present invention can be fully conveyed to those skilled in the art.

[0070] see figure 1 , the present embodiment provides a sensor layout method for a magnetoencephalographic measurement helmet, including:...

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Abstract

The present invention relates to a sensor layout method and system for a magnetoencephalogram measurement helmet, comprising: S1, based on the pre-acquired first data of the brain, acquiring the scalp surface data and cortical surface data of the brain; the pre-acquired first data of the brain One data is the data obtained by MRI scanning the brain; S2, smoothing the scalp surface data of the brain to obtain the first scalp surface data; S3, acquiring the sensor on the brain based on the first scalp surface data N position coordinates corresponding to the scalp surface data of the head; wherein, N is a preset value; S4, based on the N position coordinates corresponding to the scalp surface data of the brain and the cortical surface data of the sensor to obtain M The distribution direction and distribution position of sensors in the magnetic brain measurement helmet; where M is smaller than N. The present invention considers the scalp surface of the brain and the cortical surface of the brain at the same time, so that the finally obtained sensor distribution positions are very reasonable.

Description

technical field [0001] The invention relates to the technical field of sensor layout, in particular to a sensor layout method and system for a magnetic brain measurement helmet. Background technique [0002] Magnetoencephalography (MEG) is a powerful neuroimaging technique that provides a noninvasive window into brain electrophysiology. Conventional MEG systems are based on cryogenic sensors (SQUID-MEG) to detect small extracranial magnetic fields generated by synchronized currents in neuronal assemblies, however, such systems have fundamental limitations. In recent years, non-cryogenic quantum sensors, namely optically pumped magnetometers (OPMs), combined with new techniques for precise background magnetic field control, promise to remove these limitations and provide adaptable and motion-robust OPM-MEG systems that improve data quality, lower costs. Despite its exciting potential, OPM-MEG is still an emerging technology that still needs further development. While multi...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): A61B5/245A61B5/055A61B5/00G06T17/20
CPCA61B5/245A61B5/055A61B5/6803G06T17/20A61B2562/02A61B2562/04A61B5/0042
Inventor 宁晓琳王文丽高阳房建成
Owner HANGZHOU INNOVATION RES INST OF BEIJING UNIV OF AERONAUTICS & ASTRONAUTICS
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